Deposition of Hydrogen-Free Diamond-Like Carbon Film and Its Application to Field Emission Devices

抄録

Hydrogen-free Diamond-Like Carbon (DLC) films were deposited by layer-by-layer technique using plasma enhanced chemical vapor deposition, i.e., deposition of thin DLC layer and subsequent CF_4 plasma exposure on its surface alternatively. The hydrogen-free DLC film could be grown at 200 sec CF_4 plasma exposure on 5 nm DLC layer. The layer-by-layer deposited, hydrogen-free DLC film shows an efficient electron emission ; the onset field emission was found to be 18 V/μm and a barrier energy for emission to be 0.06 eV.