極高真空領域における物理吸着研究装置の開発

抄録

An experimental system was developed for the physisorption study of hydrogen at substrate temperatures between 1.8 K and 10 K and at pressures down to 10^－10 Pa. The vaccum system was separated into two rooms by a bulkhead ; the upper chamber contained a cryostat equipped with a 4 K mechanical refrigerator and the lower one a substrate kept in an extremely high vacuum. Helium was liquefied at the refrigerator in the upper chamber and was stored in a pot in the lower one. The substrate was directly attached to the helium pot. The substrate temperature was controlled with an accuracy of 0.1 K by a heater located in the helium pot. The adsorption density of hydrogen physisorbed on the copper surface was measured with use of the electron stimulated desorption method. The mean residence time of hydrogen was directly determined by applying this technique to the transient state of adsorption. The adsorption isotherms were obtained by monitoring the hydrogen ion yield as a function of the pressure in the adsorption equilibrium state.