表面と真空
Online ISSN : 2433-5843
Print ISSN : 2433-5835
特集「二次元層状物質の成長とその場評価―真空・表面技術による高品質薄膜の実現を目指して―」
グラフェンの結晶成長の熱放射光によるその場顕微観察
寺澤 知潮 平良 隆信小幡 誠司斉木 幸一朗保田 諭朝岡 秀人
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2019 年 62 巻 10 号 p. 629-634

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Graphene, an atomically thin sheet composed of sp2 carbon atoms, has been the most attractive material in this decade. The fascinating properties of graphene are exhibited when it is monolayer. Chemical vapor deposition (CVD) is widely used to produce monolayer graphene selectively in large-area. Here we introduce “radiation-mode optical microscopy” which we have developed in order to realize the in-situ observation of the CVD growth of graphene. We show the method to observe graphene as bright contrast on Cu substrates in thermal radiation images. The growth mechanism, the nucleation site and rate limiting process, revealed by the in-situ observation is presented. Finally, we show the CVD growth of graphene on Au substrates, resulting in the tuning of the emissivity of graphene by the pre-treatment procedures. Our method is not only a way to observe the graphene growth but also shed light on the thermal radiation property of graphene.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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