2019 Volume 62 Issue 7 Pages 406-410
We fabricated non-doped titanium dioxide films using plasma-assisted deposition. According to X-ray diffraction (XRD) analyses, the crystal structures of as-grown films were almost amorphous without depending on the oxygen plasma concentration. The transmittance spectra showed about 60% transparency in visible light wavelength when the films were fabricated with 40%-O2 plasma, and then it was experimentally found to reveal lower resistivity than the other O2 concentrations. The resistivity obtained by present study were quite lower than the other reports in non-doped films as-grown. It is suggested that the conduction mechanism in the films can be attributed to the oxygen vacancy as considering the characteristics after post-annealing.
