抄録
Plasma-induced interface reaction is a key of plasma processing, which is an inevitable tool of contemporary science and technology. Studies on “Plasma-induced surface and interface reaction” are one of important fields of surface science, as well as that of vacuum science.
この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja