2020 Volume 63 Issue 6 Pages 283-288
This paper describes the newly developed two magnetron sputtering cathodes with a magnetic mirror configuration for a low gas and power operation and an inward enlargement of the doughnut-shaped plasma discharge area. These cathodes were named Magnetic Mirror-type Magnetron Cathode (M3C). Those magnetic field profiles have a simple structure using two cylindrical permanent magnets placed behind the disk-shaped sputtering target. In the case of M3C ver.1 (M3C1), the magnetic mirror configuration near the target center and the target edges enables a low DC input power operation down to 5 W at 0.26 Pa (Ar). In the case of M3C ver.2 (M3C2), both a pinhole-centered magnet and a tilt of magnetization vector to the normal to the target surface play an important role for the inward enlargement of the plasma discharge area.