2021 年 64 巻 3 号 p. 118-125
Spin-orbit interaction, which couples electron spin to its momentum, is a relativistic effect that appears in solid-states physics. Specifically, Rashba spin-orbit interaction, which is proportional to external electric field, plays a key role in realizing novel devices such as a spin FET and topological computers. Here, we report high gate controllability of the spin-orbit interaction in III-V semiconductor nanowire transistors with various geometries. We demonstrate a gate-all-around InAs nanowire transistor and a nearby back-gate InSb nanowire transistor, both of which enable us to apply strong electric field to an electron channel. Consequently, the gate tunability of Rashba spin-orbit interaction is more than ten times higher than those reported for III-V semiconductor FETs, including nanowire FETs with a standard back-gate geometry and Schottky FETs fabricated from two-dimensional quantum wells, all of which were studied as candidates of a spin FET. Our results pave a way toward realizing a nanoscale spin FET in the future.