特集「表面分析における装置・計測・解析手法の発展と応用例」
実験室系硬X線光電子分光法の展開
2022 年 65 巻 3 号 p. 109-114
詳細
2022 年 65 巻 3 号 p. 109-114
In this paper, we describe the basic performance of laboratory-based hard X-ray photoelectron spectroscopy (HAXPES Lab.) as well as various measurement examples and future prospects. We investigated the energy resolution and measurement time using Au plate and 30 nm thickness thermal oxide on the Si substrate. The energy resolution of HAXPES Lab. is comparable to that of conventional XPS with AlKα X-ray source, and the measurement time is only 10 times longer than that of synchrotron radiation facilities to ensure the same photoelectron counts. As real device samples, we evaluated the location dependence of the chemical bonding states of the high aspect ratio trench structure, one of the structures of LSI devices, and protein adsorption by controlling the orientation of biomaterials.
