By means of plasma CVD (Chemical vapor deposition), a HMDSO (hexamethyldisiloxane) polymeric film is formed on a periodic pattern consisting of photoresist. Pattern pitch is ranging from 0.39 to 1.5 μm. The deposition property is evaluated by SEM (scanning electron microcopy) observation. As the flatness factor, height ratio of polymeric film surface at concave and convex positions of the periodic pattern. At the pattern pitch of 0.75μm, the threshold of flatness is observed. Above the threshold, flatness factor is approximately 0.5. Below the threshold, good flatness is confirmed, however, micro void is formed. Mechanism of void formation is discussed. (Received : August 6,2001)
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