Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (B_s) and low coercivity. Magnetic properties except for B_s and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high B_s CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

Thiol derivatized (6S,7R,10R)-4-amino-2,2, 7-trimethyl-10-isopropyl-1-azaspiro [5.5J undecane-1-yloxyl was synthesized to modify the surface of a gold electrode with its self-assembled monolayer. This modified electrode showed symmetrical reversible redox wave at +0.62 V vs. Ag / AgCl, which originates from the electron transfer between the self-assembled monolayer and electrode. The modified electrode exhibited an enantioselective catalytic oxidation for chiral secondary alcohols ; (S)-(−)-1-phenylethanol was oxidized into the ketone more efficiently than (R)-(+)-l-phenylethanol.

Deposition and dissolution mechanism of lithium on the aluminum substrate has been investigated by electrochemical impedance spectroscopy (EIS) and x-ray photoelectron spectroscopy (XPS). Every impedance diagram obtained during deposition and dissolution periods consists of two loops. The diameter of the high-frequency loop is almost constant regardless of the amount of deposition or dissolution, while the magnitude of the low-frequency loop decreases with increasing deposition period, and increases with increasing dissolution period. XPS results showed a surface film, which consists of an outer LiF layer and an inner LiOH-Li₂O layer, forms on the Li-Al alloy. Thickness of the LiOH-Li₂O layer increases with dissolution period. The mathematical analysis of a model mechanism suggests that the high-frequency loop of the impedance diagram may correspond to both the charge-transfer resistance and the resistance of the LiF layer. The low-frequency loop may comprise the diffusion process of Li⁺ in the LiOH-Li₂O layer, the coverage relaxation of the adsorbed species Li_ads and Li⁺ _ads, and the alloying process of Li-Al.