
“Electrochemical Formation of Si Films by Co-deposition of Si and Zn in Molten KF–KCl–K2SiF6–ZnCl2 Systems” by Mr. Wataru Moteki et al. is selected as an Editor’s Choice.This paper is a systematic study by Dr. Nohira and co-workers on the electrochemical formation of crystalline Si films assisted by Zn co-deposition in molten salt bath. Crystalline Si film is a paramount material to achieve durable Si-based solar cells. The authors developed here the fascinating method to create crystalline Si films with larger grain sizes. Upon ZnCl2 addition to the base KF-KCl-K2SiF6 bath, liquid Si-Zn alloy with good wettability against graphite substrate was deposited, followed by the Si film deposition beneath the Si-Zn alloy layer. Subsequent removal of the upper Si-Zn layer resulted in the single Si films with larger grain size.

“Gold- and Silver-Nanoparticle-Assisted Etching of p-Si and n-Si: A Discussion of Etching Behavior Based on Polarization Curves” by Professor Ayumu Matsumoto et al. is selected as an Editor’s Choice. This Paper because of its high rating by reviewers and editors. Metal-assisted etching is a crucial method for making Si nanostructure; however, its mechanism with different metals has been clarified yet. In this article, the authors investigated the mechanism of etching assisted by Au- and Ag-nanoparticles, which are known to cause different functions for remote etching (namely, general corrosion). The etching behavior of bare Si, metal deposited Si, and metal wires were also discussed based on their polarization curves.