IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Volume 123, Issue 12
Displaying 1-11 of 11 articles from this issue
Special Issue on Functional Materials and Process Technology
Special Issue Review
Special Issue Paper
  • Mikio Umeda, Yasuhiro Sakai, Kentaro Nakamura
    2003 Volume 123 Issue 12 Pages 534-540
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    This paper presents a self-generation piezoelectric sensor device for a wireless alarm system. A piezo-generator composed of a steel ball and piezoelectric vibrators senses the impact-induced vibration, and transforms its mechanical energy into electric energy to drive a wireless transmitter. First, the thickness and poling direction / electrode connection of the piezoelectric vibrator are examined to improve the efficiency of the piezo-generator. Next, the mechanical oscillations of a cantilever spring are used to repeat the impact and accumulate the electric energy up to the level enough for driving a micro-computer and a radio transmitter. A prototype wireless alarm system was assembled and worked successfully.
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  • Junji Ohara, Kazuhiko Kano, Yukihiro Takeuchi
    2003 Volume 123 Issue 12 Pages 541-547
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    The DRIE (Deep Reactive Ion Etching) process is one of the most important processes for MEMS field. Especially, a high aspect ratio etching is essential for state-of-the-art devices. This paper describes a new DRIE process that drastically improves the highest aspect ratio of conventional DRIE process. The conventional process deposits a protection layer not only on a trench sidewall, but also on a trench bottom. This isotropic deposition causes a limitation of aspect ratio. To avoid this situation, we have developed a new process that alternately repeats the conventional DRIE process and a O2 plasma irradiation which forms a thin SiO2 layer inside the trench within a same chamber. The SiO2 layer remains on the sidewall during the DRIE proceeds while it on the bottom is removed at the beginning of each DRIE. Therefore, the etching anisotropy is improved. A switching between the conventional DRIE and the O2 plasma irradiation needs only to change introducing gasses. This simple process can widen a possibility of the conventional DRIE.
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  • Katsuhiko Tanaka, Atsushi Sakurai, Teppei Kubota, Yukio Sakabe
    2003 Volume 123 Issue 12 Pages 548-552
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    The combination of PZT ceramics with excellent ferroelectric, piezoelectric, and pyroelectric properties with Si micromachining techniques promises the creation of various microdevices including sensors and actuators. The most important technique is the preparation of functionally combined wafers of PZT ceramics and Si single crystals. Three useful techniques that are the fabrication of PZT thin films on Si, the fabrication of PZT thick films on Si and the wafer bonding of PZT and Si are discussed from the point of view of the properties and micromachining of PZT. Thin PZT films on Si are most suitable for microdevices because of their micromachining capability. Thick PZT films on Si are useful for microactuators which create a large force. The wafer bonding of PZT and Si has an advantage in that it delivers the excellent functionalities of PZT ceramics, though its micromachining is difficult.
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  • Hironori Taguchi, Tetsuo Soga, Takashi Jimbo, Masayoshi Umeno
    2003 Volume 123 Issue 12 Pages 553-559
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    A new method of chemical bonding for GaAs on Si has been developed using SeS2. The bonding between GaAs and Si is very robust and withstands many processing steps. Using the epitaxial lift off (ELO) technique the thin film of GaAs is grafted to Si substrate. The film bonded by this method has longer minority carrier lifetime than heteroepitaxial GaAs film on Si. The current-voltage(I-V)characteristics of p-GaAs/n-Si, n-GaAs/n-Si, p-GaAs/p-Si and n-GaAs/p-Si were measured at room temperature. The I-V curve did not show a rectifying behavior when GaAs was bonded to Si with SeS2 because of the formation of a high-resistance layer at the interface. The characteristics were greatly improved bsuby small additions of Sn to SeS2 during the bonding process. The very low resistance is obtained with adding Sn in SeS2 during the bonding. The properties of solar cells using this method were compared with those grown on Si substrate by heteroepitaxy and GaAs substrate.
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Special Issue Technical Note
paper
  • Tadashi Sonobe, Hiroyuki Fujita
    2003 Volume 123 Issue 12 Pages 565-570
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    A new type of PLC (Planar Lightwave Circuit)-Optical circulator arranged in a straight line has been successfully fabricated. This device shifts the light propagation direction aside by using blazed diffraction grating, which is realized by MEMS fine fabrication technique. The device is inherently small, and eliminates precise alignment and a magnetic garnet crystal required in conventional bulk devices.
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  • Naoki Akamatsu, Takafumi Suzuki, Kunihiko Mabuchi, Hiroyuki Fujita, Be ...
    2003 Volume 123 Issue 12 Pages 571-576
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    In order to realize long-term stable multi-channel neural recording, a micro probe array based on a flexible polyimide substrate was designed and fabricated. Each probe was formed by etching a silicon wafer using a Deep RIE equipment. This type of flexible microelectrode can be attached around the soft nervous tissue. This paper shows the fabrication process and the analysis on the flexibility of the electrode to estimate the utility for the application to tissues (brain, nerve, retina, and so on).
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  • Toshiyuki Tsuchiya, Hirofumi Funabashi
    2003 Volume 123 Issue 12 Pages 577-582
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    Young’s modulus of polysilicon thin film was measured by means of a tensile tester equipped with electrostatic force grip system. The images of gauge marks on a specimen were captured by a high-speed digital CCD camera and the tensile strain was calculated from the images. Polysilicon thin film specimens were tensile tested for evaluating the resolution of the measurement system. The polysilicon specimens were 1.7 µm thick, 20 and 50 µm wide, and 100 and 500 µm in gauge length. The linear stress-strain curve was obtained and Young’s modulus was measured. The mean Young’s modulus ranged from 162 to 175 GPa, which agreed with the theoretical value and the measured values using the bulge method. The resolution and the comparison to the differential method were discussed.
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  • Kyung Il, Hidekuni Takao, Kazuaki Sawada, Makoto Ishida
    2003 Volume 123 Issue 12 Pages 583-587
    Published: 2003
    Released on J-STAGE: March 01, 2004
    JOURNAL FREE ACCESS
    In this paper, a suppression method of generated distortion on the beam structures due to thermal stress is investigated for reduction of remainder thermal drift in three-axis accelerometer for high temperatures. An arrangement of piezoresistors for acceleration detection is presented to further reduction of thermal drift. Thermal drift analysis and design of advanced three-axis accelerometer for high temperatures without temperature dependence has been carried out with the finite element method (FEM) program, ANSYS. Experimental results agreed well with these theoretical results. Design considerations that enable the three-axis accelerometer to have stable sensitivity and offset are described with the simulated results.
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Special Issue Letter
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