電気学会論文誌E(センサ・マイクロマシン部門誌)
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
123 巻, 12 号
選択された号の論文の11件中1~11を表示しています
特集:機能性材料・プロセス技術
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  • 梅田 幹雄, 坂井 康弘, 中村 健太郎
    2003 年 123 巻 12 号 p. 534-540
    発行日: 2003年
    公開日: 2004/03/01
    ジャーナル フリー
    This paper presents a self-generation piezoelectric sensor device for a wireless alarm system. A piezo-generator composed of a steel ball and piezoelectric vibrators senses the impact-induced vibration, and transforms its mechanical energy into electric energy to drive a wireless transmitter. First, the thickness and poling direction / electrode connection of the piezoelectric vibrator are examined to improve the efficiency of the piezo-generator. Next, the mechanical oscillations of a cantilever spring are used to repeat the impact and accumulate the electric energy up to the level enough for driving a micro-computer and a radio transmitter. A prototype wireless alarm system was assembled and worked successfully.
  • 大原 淳士, 加納 一彦, 竹内 幸裕
    2003 年 123 巻 12 号 p. 541-547
    発行日: 2003年
    公開日: 2004/03/01
    ジャーナル フリー
    The DRIE (Deep Reactive Ion Etching) process is one of the most important processes for MEMS field. Especially, a high aspect ratio etching is essential for state-of-the-art devices. This paper describes a new DRIE process that drastically improves the highest aspect ratio of conventional DRIE process. The conventional process deposits a protection layer not only on a trench sidewall, but also on a trench bottom. This isotropic deposition causes a limitation of aspect ratio. To avoid this situation, we have developed a new process that alternately repeats the conventional DRIE process and a O2 plasma irradiation which forms a thin SiO2 layer inside the trench within a same chamber. The SiO2 layer remains on the sidewall during the DRIE proceeds while it on the bottom is removed at the beginning of each DRIE. Therefore, the etching anisotropy is improved. A switching between the conventional DRIE and the O2 plasma irradiation needs only to change introducing gasses. This simple process can widen a possibility of the conventional DRIE.
  • 田中 克彦, 櫻井 敦, 久保田 哲平, 坂部 行雄
    2003 年 123 巻 12 号 p. 548-552
    発行日: 2003年
    公開日: 2004/03/01
    ジャーナル フリー
    The combination of PZT ceramics with excellent ferroelectric, piezoelectric, and pyroelectric properties with Si micromachining techniques promises the creation of various microdevices including sensors and actuators. The most important technique is the preparation of functionally combined wafers of PZT ceramics and Si single crystals. Three useful techniques that are the fabrication of PZT thin films on Si, the fabrication of PZT thick films on Si and the wafer bonding of PZT and Si are discussed from the point of view of the properties and micromachining of PZT. Thin PZT films on Si are most suitable for microdevices because of their micromachining capability. Thick PZT films on Si are useful for microactuators which create a large force. The wafer bonding of PZT and Si has an advantage in that it delivers the excellent functionalities of PZT ceramics, though its micromachining is difficult.
  • 田口 裕規, 曽我 哲夫, 神保 孝志, 梅野 正義
    2003 年 123 巻 12 号 p. 553-559
    発行日: 2003年
    公開日: 2004/03/01
    ジャーナル フリー
    A new method of chemical bonding for GaAs on Si has been developed using SeS2. The bonding between GaAs and Si is very robust and withstands many processing steps. Using the epitaxial lift off (ELO) technique the thin film of GaAs is grafted to Si substrate. The film bonded by this method has longer minority carrier lifetime than heteroepitaxial GaAs film on Si. The current-voltage(I-V)characteristics of p-GaAs/n-Si, n-GaAs/n-Si, p-GaAs/p-Si and n-GaAs/p-Si were measured at room temperature. The I-V curve did not show a rectifying behavior when GaAs was bonded to Si with SeS2 because of the formation of a high-resistance layer at the interface. The characteristics were greatly improved bsuby small additions of Sn to SeS2 during the bonding process. The very low resistance is obtained with adding Sn in SeS2 during the bonding. The properties of solar cells using this method were compared with those grown on Si substrate by heteroepitaxy and GaAs substrate.
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