Degradation of volatile organic compound (VOC) gas by ultrasonic mist was investigated using a batch reactor under various experimental conditions. The experiments were conducted with or without hydrogen peroxide (H
2O
2) under 254 nm of UV irradiation. In the techniques with H
2O
2, VOC gas was removed by adsorption or reaction with OH radicals generated from H
2O
2 on the mist surface or inside it. Since 100% of toluene gas could be removed under all conditions by the adsorption or reaction with OH radicals on the mist surface, we evaluated the reactivity under the various experimental conditions by their reaction rates. The removal rate of toluene under UV/H
2O
2/mist condition was faster than that under UV/pure water/mist condition. Therefore, it is evident that H
2O
2 plays an important role in the generation of OH radicals and removal of gaseous VOC. Furthermore, in cases of 200 kHz of high frequency ultrasonic irradiation for the continuous generation of H
2O
2, sufficient removal rates were obtained not only under 200 kHz/UV/pure water/mist condition but also under 200 kHz/pure water/mist condition. Therefore, the results indicate that 200 kHz of ultrasound irradiation has a capability of continuous supply of H
2O
2, and a direct reaction with toluene by creating reactive cavities.
抄録全体を表示