By heating pieces of borosilicate glass (SiO
2 81, B
2O
3 12, Na
2O+K
2O 4.5, Al
2O
3 2.5wt%) with surface stress caused by ultra-violet irradiation, stress relaxation process was observed. Results were as follows:
1. By heating up with the rate of 5°C/min, stress began to be released at about 250°C, faded away perfectly at 470°C, and did not reappear on cooling.
2. By soaking at 400°C, stress faded away perfectly in 30min. By soaking at temperatures between 250° and 360°C, stress decreased in initial periods of about 30min, and then attained at approximately constant values. The higher the soaking temperatures were, the less were these values, which did not change distinctly after cooling.
3. The temperatures described above were considerably lower than the annealing point (about 555°C) of the glass.
From these results, it was concluded that:
1. Stress is released by several mechanisms which participate in different temperature ranges.
2. Activation energies of relaxation mechanisms are presumed to be 35kcal/mol or smaller, and are considerably lower than that of viscous flow (about 100kcal/mol).
3. The stress relaxation is, therefore, presumed to be a result of, for example, reformation of deformed chemical bonds (bond angles, interatomic distances and so on) and not a result of rearrangement of network forming ions.
4. The same is possibly true for mechanisms of stress build-up.
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