Epitaxial CeO
2/Ce
1−xZr
xO
2/Y
0.15Zr
0.85O
1.93 (YSZ) buffer layers were fabricated on a Si(100) substrate by pulsed laser deposition, and its crystallinity and surface roughness were analyzed. When Ce
1−xZr
xO
2 (
x = 0–0.6) films were directly deposited on the Si(100) substrate, the films had a (111) or (111)-preferred orientation. In contrast, (100)-oriented epitaxial films of the Ce
1−xZr
xO
2 (
x = 0–0.6) were obtained by introducing a 2.5-nm-thick YSZ buffer layer between Ce
1−xZr
xO
2 and Si. Lattice parameters and surface roughness of the Ce
1−xZr
xO
2 layers on the YSZ-buffered Si(100) decreased from 0.542 to 0.525 nm (in-plane) and 0.47 to 0.12 nm, respectively, as the increase of
x from 0 to 0.6. After that, an epitaxial CeO
2/Ce
0.4Zr
0.6O
2/YSZ buffer layer was fabricated on the Si substrate. Differences in lattice parameters between CeO
2 and Ce
0.4Zr
0.6O
2 and also between Ce
0.4Zr
0.6O
2 and YSZ became about half of that between CeO
2 and YSZ. As a result, surface roughness of the CeO
2 layer on top of the Ce
0.4Zr
0.6O
2/YSZ/Si and full width at half maximum of the rocking curve of the CeO
2 (004) reflection became 0.18 nm and 0.89 degrees, respectively, which were smaller than those of CeO
2 layers deposited directly on YSZ/Si.
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