Using the radioactive tracers,
198Au,
111Ag,
59Fe, and
64Cu, experiments have been made to see how metallic impurities are absorbed on the surface of Ge, Si, Mo, clear quartz, and polyethylene from several kinds of aqueous solution, and how the absorbed impurities are desorbed by acid etching or NaCN aq. treatment. Besides, using the resistivity change of Ge by heat treatment in clean atmosphere, Cu concentration absorbed on Ge surface from water under various conditions has been measured. The experimental results are as follows: (1) Over 10
13 atoms/cm
2 of the metallic elements are absorbed on Ge and Si surfaces by dipping the crystals into water containing Au
+++, Ag
+, or Cu
++ ion (10
14 ions/c.c) for 30 min. (2) Fe(≈10
14 atoms/c.c) in water is scarcely absorbed on any of the substances (<10
10 atoms/cm
2) for 30 min at pH=1, but absorbed largely (>10
12 atoms/c.c) at pH=7. (3) Au, Ag (≈10
14 atoms/c.c) in HF+HNO
3, and Au (≈10
14 atoms/c.c), Fe(≈10
15 atoms/c.c) in NaCN aq. can be absorbed considerably (10
10∼10
13 atoms/cm
2 for 30 min) on Ge and Si surface. The degree of cleanness of the surface of Ge, or Si as etched with acid, dipped in NaCN aq. and washed with pure water, is limited by the facts (1), (2) and (3).
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