The surface hardness, electrical resistance and microstructure of Al implanted with 10 to 50 keV B
+, N
+, and Ar
+ ions to a dose of 10
15 to 10
17 ions cm
−2 were measured, and the effects of ageing on the above characteristics were studied.
The results are as follows:
(1) The surface hardness of Al implanted with B
+, N
+, and Ar
+ ions increases with the increase of the energy and the dose of ions. The hardness increase is in the following order; B
+<N
+<Ar
+.
(2) The residual electrical resistance of Al implanted with B
+, N
+, and Ar
+ ions increases with the increase of the energy and the dose of ions.
(3) The surface hardness and the residual resistance of Al implanted with B
+ and N
+ ions increase by ageing for a dose of 10
17 ions cm
−2, but decrease monotonously by ageing for a dose less than 10
16 ions cm
−2.
(4) The clustreing of the ions or a fine scale precipitate as well as the dislocation line and the dislocation loop are observed in Al specimens which are implanted with more than 10
16 B
+ ions cm
−2 or more than 10
15 N
+ or Ar
+ ions cm
−2. The coarse precipitate and Al-AlB
2 eutectic are formed by ageing in Al implanted with B
+ ions, and Ar bubbles precipitate in Ar
+ ion-implanted Al.
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