巻号一覧
25 巻, 2 号
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論文
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吉田 昌二, 水嶋 隆夫, 牧野 彰宏, 井上 明久2001 年 25 巻 2 号 p. 80-84
発行日: 2001年
公開日: 2007/02/02
ジャーナル オープンアクセスThe effects of annealing temperature on the magnetic properties of consolidated Fe-Al-Ga-P-C-B-Si glassy alloy prepared by the pulse-current-sintering method were investigated. A high relative density of 99% combined with good soft magnetic properties was obtained for a sintering temperature of 703 K in the as-sintered state. The flux density under an applied field of 800 A/m (B800), relative permeability at f=1 kHz (μ'1 kHz), and core loss at f=50 Hz and Bm=0.5 T (W5/50) for the sample sintered at 703 K in the as-sintered state were 1.08T, 1,700, and 0.2 W/kg, respectively. B800,μ'1 kHz, and W5/50 were improved to 1.17 T, 2,500, and 0.11 W/kg by annealing at 723K for 3.6ks. It is considered that these improvements were due to stress relaxation of the consolidating process originating in structural relaxation of the amorphous structure.抄録全体を表示PDF形式でダウンロード (292K) -
平野 聡, 川端 良昌, 林 信夫2001 年 25 巻 2 号 p. 85-90
発行日: 2001年
公開日: 2007/02/02
ジャーナル オープンアクセスIt was confirmed that the relaxation scheme which was used by LaBonte to derive the equilibrium magnetization structure iteratively can be accelerated significantly by the application of the multigrid method. In test calculations performed with three kinds of grids for a thin perpendicular anisotropic film and a magnetic particle with a cubic shape, a speedup of more than ten times in the number of iterations was achieved when the lattice constants in the coarsest grid did not exceed the convergence limit of the original LaBonte method. Detailed descriptions are given for the derived method and the results of the test calculations.抄録全体を表示PDF形式でダウンロード (413K) -
木村 道哉, 山田 良樹, 中根 了昌, 中村 基訓, 末岡 和久, 武笠 幸一2001 年 25 巻 2 号 p. 91-94
発行日: 2001年
公開日: 2007/02/02
ジャーナル オープンアクセスSpin-polarized scanning tunneling microscopy (SP-STM) is a promising technique for atomically resolved surface magnetic structure imaging. Since SP-STM is a surface-sensitive technique, the sample to be observed, such as a magnetic nanostructure, is required to have a well-defined clean surface. The magnetic sample preparation technique presented in this paper makes it easy to fabricate magnetic nanostructures in a vacuum. An Si3N4 membrane with submicron holes was used as a shadow mask for thin-film deposition. Conventional silicone processes were employed to make the Si3N4 membrane, and the shadow mask holes were formed on it using focused ion beam etching. The usability of this shadow mask was demonstrated by forming Co thin-film nanostructures on an Si substrate through the mask. The nanostructures were characterized by atomic force microscopy and magnetic force microscopy.抄録全体を表示PDF形式でダウンロード (290K)
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