Experimental study was made to investigate the controlling factors on the vapor de-position rate on reactor rotating shield plug annulus, which is exposed to the vapor entrained cover gas during reactor operation. Two simulated test assemblies having annuli were made for this purpose and were installed into a small test vessel. In the experiment, the average deposition rates on the annular walls of the test assemblies were measured for various pool temperatures, and their dependents upon such parameters as pool temprature
Ts (or the saturated vapor pressure
Ps at pool surface), cover gas pres-sure
PG, and temperature drop
ΔTG across cover gas, were studied.
The results revealed that the dominant controlling factor was the vapor pressure
Ps at pool surface. Dependent of the average deposition rate φd upon the above parameterswas simply expressed by :
φd=
BρsDsΔTG, where,
ρs is the saturated vapor concentrationat pool surface,
Ds the vapor diffusion coefficient, and B the proportional constant.
To these experimental results, the previously published evaporation rate data and the theoretical evaporation rate equation based on Epstein & Rosner's theory were reviewed. Then correlation between the deposition and the evaporation rates was dis-cussed.
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