プラズマ・核融合学会誌
Print ISSN : 0918-7928
80 巻, 4 号
選択された号の論文の10件中1~10を表示しています
Rapid Communications
解 説
  • 行村 建, WEI Ronghua
    2004 年 80 巻 4 号 p. 281-288
    発行日: 2004年
    公開日: 2004/09/22
    ジャーナル フリー
    Plasma-Based Ion Implantation and Deposition (PBII&D) has been developed for surface modification of three dimensional materials immersed in plasma. The ions are implanted into the material to which a train of pulsed voltage are directly applied so as to make an ion sheath around the surface of the material. During the ion implantation, plasma species and their compound materials are simultaneously deposited on the materials. This is a cost-effective and simple surface modification system. Conformal ion implantation can be carried out by this method. Metallic arcs such as cathodic arc and gas discharges using organic metallic gas have been used. In addition to the negative bias application system for extracting positive ions, positive pulse application system to extract electrons to heat the materials and positive pulsed bias method have been also developed. As industrial applications, the surface modification of inside pipes by PBII&D is introduced.
小特集 「プラズマフロー速度シアの揺動・構造形成への成果」
講 座 「核融合材料の照射下挙動に関するマルチスケールモデリング」
研究論文
  • 西村 博明, 重森 啓介, 中井 光男, 藤岡 慎介, 島田 義則, 橋本 和久, 山浦 道照, 内田 成明, 松井 亮二, 日比野 隆宏, ...
    2004 年 80 巻 4 号 p. 325-330
    発行日: 2004年
    公開日: 2004/09/22
    ジャーナル フリー
    A new research project on extreme ultraviolet(EUV) source development has been started utilizing resources of laser fusion research. The main task of the project is to provide a scientific basis for generating efficient, debris-free, high power EUV plasma source for production of semiconductor devices. Spherical solid-tin targets were illuminated uniformly with twelve beams from GEKKO XII to create spherical plasmas, and EUV emission spectra were absolutely measured. The highest conversion efficiency of 3 % to 13.5 nm EUV light in 2 % bandwidth was attained at irradiance of around 5×1010W⁄cm2. The experimental data were well reproduced by a theoretical model taking power balance in the EUV plasma into consideration.
feedback
Top