Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 17, Issue 4
Displaying 1-4 of 4 articles from this issue
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  • Study of Solid Surfaces by Electron Impact Desorption Technique
    Mitsuaki NISHIJIMA, Kenzo FUJIWARA, Toshio MUROTANI
    1974 Volume 17 Issue 4 Pages 108-117
    Published: April 20, 1974
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.17.108
    JOURNAL FREE ACCESS
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  • Recent Progress and Application of Mass Filter
    II. Instrument and Application
    Tadashi SAKAI
    1974 Volume 17 Issue 4 Pages 118-125
    Published: April 20, 1974
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.17.118
    JOURNAL FREE ACCESS
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  • Pulsed Gas Shutter
    Hajime ISHIMARU, Nobuaki YAGI
    1974 Volume 17 Issue 4 Pages 126-130
    Published: April 20, 1974
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.17.126
    JOURNAL FREE ACCESS
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    To reduce the gas flow from the ion source to accelerating tube, rotating disk pulsed gas shutter mounted on test vacuum chamber has been constructed and tested. The timig of periodic opening is synchronized to an external 20 Hz master pulse. Gas flow into the ion source is continuous and the outflow from the source to accelerating tube is pulsed. Average flow has been reduced from 2.7×10-2Torr.l/sec to 2.7×10-3Torr.. l/sec for operation, it is possible to eliminate the use of a conventional high speed, large capacity pump.
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  • Ion Nitriding
    Junichi AIKAWA
    1974 Volume 17 Issue 4 Pages 131-137
    Published: April 20, 1974
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.17.131
    JOURNAL FREE ACCESS
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    The ion nitriding has many advantages for the gas nitriding or the salt-bath method. To obtain nessesary data to scale-up the ion nitriding to an industrial scale is purposed. (1) A suitable pumping system for the ion nitriding is a combination of a mechanical booster and a rotary pump. (2) Mixed gas of nitrogen and hydrogen with the ratio of 2 to 1 is suitable for the treating gas. (3) Gamma-dash phases are usually observed and epsilon phases are not appeared in the experimental range of 0.05 to 2 Torr for S45C, SACM-1 and eutectic cast iron F2 even though the thicknesses of the layers are different for each materials. (4) Temperature which the nitriding effect becomes evident is approximately 300°C for laboratorious and industrial scale of time. (5) Activation energies of ion nitriding are 14.7, 16.2, 17.3, and 22.4 for SACM-1, S45C, SUS304 and F2, respectively, which are farely lower than them of gas nitriding. (6) Size changes due to the ion nitriding at 500°C, 10 hours are within 2, 3, 5, and 12 microns increase for S45C, SACM-1, F2 and SUS304, respectively, which are nearly same as them reported for gas nitriding.
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