巻号一覧
18 巻, 2 号
選択された号の論文の2件中1～2を表示しています
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永嶋 誠一, 村上 正紀, Didier de Fontaine, 小倉 〓1975 年 18 巻 2 号 p. 39-44
発行日: 1975/02/20
公開日: 2009/10/14
ジャーナル フリーThe epitaxial temperature of Cu films evaporated on a mica substrate has been studied using a conventional x-ray diffraction method. The epitaxial temperature determined by (111) integrated intensities was in the vicinity of 170°C. This result has been confirmed using the back-Laue method. The effect of annealing polycrystalline Cu films evaporated on a substrate kept below the epitaxial temperature has also been investigated by the x-ray diffraction method. By the changes in the (111) integrated intensities of Cu films annealed at higher temperatures a value of approximately 0.19eV was obtained as the activation energy of grain growth during the initial stages of the growth process.抄録全体を表示PDF形式でダウンロード (921K) -
金持 徹, 豆田 順一, 加護谷 隆己, 永田 三郎1975 年 18 巻 2 号 p. 45-53
発行日: 1975/02/20
公開日: 2010/01/27
ジャーナル フリーIron atoms were deposited on a carefully cleaned MgO (001) surface kept at room temperature, and growth mode of epitaxial film was studied by a conventional four-grid LEED-AES system. Deposition rate was about one angstrom per minute and residual gas pressure during the deposition was 5-6 × 10-9 Torr. Change rates of Auger peak-to-peak heights of substrate and deposit during the film formation were not similar. From these curves and some additional evidences, it seemed that the film grew up through the “Stranski-Krastanov mode”.抄録全体を表示PDF形式でダウンロード (1443K)
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