Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Volume 21, Issue 5
Displaying 1-3 of 3 articles from this issue
  • Hajime ISHIMARU
    1978 Volume 21 Issue 5 Pages 145-157
    Published: May 20, 1978
    Released on J-STAGE: April 23, 2010
    JOURNAL FREE ACCESS
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  • Koichi SUZUKI, Mamoru MIZUHASHI, Hironobu SAKATA
    1978 Volume 21 Issue 5 Pages 158-167
    Published: May 20, 1978
    Released on J-STAGE: January 28, 2010
    JOURNAL FREE ACCESS
    RF planar magnetron sputtering apparatus has been used to prepare transparent conductive SnO2 films on glass, using Sb-doped SnO2 targets. The deposition rate, electrical properties, optical properties, and crystal structures (by X-ray diffraction) of the films have been investigated in relation to various sputtering conditions. By this technique, much higher deposition rate (above 1000 Å/min.) than those reported in the past has been achieved, satisfying both low electrical resistivity (2-3×10-3 Ωcm) and high visible transmission (80-90%). The highly oriented (101) SnO2 films previously not reported have shown the lowest electrical resistivity. In order to obtain such high conductive SnO2 films at higher rates, it is required to find an optimum oxygen partial pressure, depending upon the deposition rate.
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  • Yasuo FUJII, Hiroshi MIMA, Kunio YAGI, Futoshi KANEMATSU
    1978 Volume 21 Issue 5 Pages 168-173
    Published: May 20, 1978
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
    A new ionization gauge designed to intercept the direct soft X-ray injecting to the ion collector has been tested. It was found that the sensitivity of this gauge was considerably high in comparison with that of the conventional B-A gauge. Collector current vs pressure characteristic war linear over the range of the pressure from 1×10-9 4×10-1 Torr. It could be expected that this gauge may be used in the range of XHV.
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