Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 22, Issue 4
Displaying 1-3 of 3 articles from this issue
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  • Pa (pascal) and Torr
    Substitution of Pressure Unit to the SI in Vacuum Industry
    Akio ITO, Hiroshi NAKAGAWA
    1979 Volume 22 Issue 4 Pages 139-147
    Published: April 20, 1979
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.22.139
    JOURNAL FREE ACCESS
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  • Ellipsometric Measurements of Oxide Formation Process for Josephson Junctions
    Hideo SUZUKI, Takeshi IMAMURA, Shinya HASUO, Koichi DAZAI
    1979 Volume 22 Issue 4 Pages 148-157
    Published: April 20, 1979
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.22.148
    JOURNAL FREE ACCESS
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    Josephson tunneling junctions have been fabricated using the rf plasma oxidation method. Prior to the junction formation, the oxide growing processes on Pb or Pb-In alloy films have been investigated in detail with the aid of in situ ellipsometry. The oxide thickness tends to saturate under appropriate oxidation and sputtering parameters. The steady state oxide thickness has been in the 6070 Å range for Pb and in the 4050 Å range for Pb-In alloy (In 10 wt%). Referring these results, we have fabricated tunneling junctions whose base electrodes have been made of Pb-In/Au alloy film. The counter electrodes have been made of Pb-In alloy film or sequentially deposited Pb/ Au/Pb film. The junctions with Pb/Au/Pb counter electrodes have exhibited good I-V characteristics with little scattering of the normal tunneling resistance.
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  • Reduction of Contamination in Analytical Electron Microscopy
    Takeshi TOMITA, Yoshiyasu HARADA, Hisao WATANABE, Terukazu ETOH
    1979 Volume 22 Issue 4 Pages 158-164
    Published: April 20, 1979
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.22.158
    JOURNAL FREE ACCESS
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    This paper describes the method to measure quantitatively the contamination caused by the use of a micro electron probe, and instrumental improvements for reducing it. These improvements include the adoption of a new type of vacuum grease and the development of a new type anti-contamination device. Since the weight of contamination deposits changes lineally with the probe irradiation time, a highly accurate method of contamination measurement has been established by indicating the contamination rate in g/min. Thus, it has become possible to correctly evaluate instrumental improvements for reducing contamination. The partial pressure of hydrocarbon gases in the specimen chamber was reduced by approx. one order, through various instrumental improvements. This resulted in a drastic reduction of the contamination rate and therefore in the performance improvement of the analytical electron microscope. In this experiment, any specimen pre-treatment that eliminates contamination source existing in a specimen itself, was not carried out. But it is now important to establish such a treatment in order to further reduce the contamination.
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