真空

Pa (パスカル) とTorr (トル)

真空工業における圧力単位のSIへの移行

伊藤昭夫, 中川洋

1979 年 22 巻 4 号 p. 139-147
発行日: 1979/04/20
公開日: 2009/09/04

DOIhttps://doi.org/10.3131/jvsj.22.139

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エリプソメータを用いたジョセフソン接合酸化膜の形成過程の測定

鈴木秀雄, 今村健, 蓮尾信也, 太宰浩一

1979 年 22 巻 4 号 p. 148-157
発行日: 1979/04/20
公開日: 2009/09/04

DOIhttps://doi.org/10.3131/jvsj.22.148

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Josephson tunneling junctions have been fabricated using the rf plasma oxidation method. Prior to the junction formation, the oxide growing processes on Pb or Pb-In alloy films have been investigated in detail with the aid of in situ ellipsometry. The oxide thickness tends to saturate under appropriate oxidation and sputtering parameters. The steady state oxide thickness has been in the 6070 Å range for Pb and in the 4050 Å range for Pb-In alloy (In 10 wt%). Referring these results, we have fabricated tunneling junctions whose base electrodes have been made of Pb-In/Au alloy film. The counter electrodes have been made of Pb-In alloy film or sequentially deposited Pb/ Au/Pb film. The junctions with Pb/Au/Pb counter electrodes have exhibited good I-V characteristics with little scattering of the normal tunneling resistance.

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分析電子顕微鏡における試料汚染の改善

富田健, 原田嘉晏, 渡辺久雄, 江藤輝一

1979 年 22 巻 4 号 p. 158-164
発行日: 1979/04/20
公開日: 2009/09/04

DOIhttps://doi.org/10.3131/jvsj.22.158

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This paper describes the method to measure quantitatively the contamination caused by the use of a micro electron probe, and instrumental improvements for reducing it. These improvements include the adoption of a new type of vacuum grease and the development of a new type anti-contamination device. Since the weight of contamination deposits changes lineally with the probe irradiation time, a highly accurate method of contamination measurement has been established by indicating the contamination rate in g/min. Thus, it has become possible to correctly evaluate instrumental improvements for reducing contamination. The partial pressure of hydrocarbon gases in the specimen chamber was reduced by approx. one order, through various instrumental improvements. This resulted in a drastic reduction of the contamination rate and therefore in the performance improvement of the analytical electron microscope. In this experiment, any specimen pre-treatment that eliminates contamination source existing in a specimen itself, was not carried out. But it is now important to establish such a treatment in order to further reduce the contamination.

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