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Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 26, Issue 12
Displaying 1-5 of 5 articles from this issue
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  • Transparent Conductive ZnO Films Prepared by rf Diode Sputtering
    Tatsuo NAKAZAWA, Kentaro ITO
    1983 Volume 26 Issue 12 Pages 889-894
    Published: December 20, 1983
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.26.889
    JOURNAL FREE ACCESS
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  • Hydrogen and Deuterium Sorption Experiment of Metal Hydride Compound, TiMn1.5 in Vacuum
    Motoyuki SUZUKI, Kenya AKAISHI
    1983 Volume 26 Issue 12 Pages 895-903
    Published: December 20, 1983
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.26.895
    JOURNAL FREE ACCESS
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    Pumping of hydrogen and deuterium gases by TiMn1.5 was performed at pressures around 1.3 × 102 Pa (1 Torr). TiMn1.5 was degassed at 550°C and hydrided at 1 atm at room temperature prior to the pumping experiment. TiMn1.5 which had been exposed to the air for a long time required reduction of the oxidized surface by hydrogen at 550 °C. The average amount of absorbed hydrogen gas when equilibrium reached around 102 Pa (0.75 Torr) was about 4 Pa · m3 (30 Torr · l), and the corresponding hydrogen composition ratio (H/M) was 2.3 × 10-2.
    Heating of TiMn1.5 to 400 °C made it to release almost all hydrogen and deuterium gases. From the thermal desorption spectra during dehydriding, the sorption mechanism of hydrogen and deuterium can be explained as the adsorption on segregated titanium surface instead of the solution into the bulk metal. The activation energies of H2 and D2 desorption are 27 and 25 kcal/mol respectively.
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  • Study on the Unidirectional Vacuum Gauge by Detecting Excited Neutrals
    Ichiro ARAKAWA, Muntaek KIM, Yutaka TUZI
    1983 Volume 26 Issue 12 Pages 904-912
    Published: December 20, 1983
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.26.904
    JOURNAL FREE ACCESS
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    An unidirectional vacuum gauge, which detects gas molecules coming from a certain direction in chaotic space, can be realised by means of detecting excited neutrals which are generated by electron impact. To eliminate photons and ions from detection was found to be effective measure in order to improve the performance of the gauge. The advantages of sharp directivity, small size, and high signal to background ratio were confirmed. The measured value of the gauge sensitivity is in good agreement with the expected one. This type of gauge, moreover, can measure the time of flight spectrum of gas molecules, that makes it possible to evaluate not only the anisotropy of molecular density in space but also the anisotropy and the nonequilibrium of molecular velocity distribution.
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  • Leak Detection of a Vacuum System by an Unidirectional Vacuum Gauge
    Analysis of the Measurement of a Point Gas Source
    Ichiro ARAKAWA, Yutaka TUZI
    1983 Volume 26 Issue 12 Pages 913-918
    Published: December 20, 1983
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.26.913
    JOURNAL FREE ACCESS
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    The application of an unidirectional vacuum gauge to the leak detection of a vacuum chamber is examined theoretically. The informations contained in the output signal of the gauge that sees a point gas source in a vacuum chamber are analyzed and its results are applied to the problem of the leak detection of large scale vacuum systems in numerical manner. The lower limit of detection correlates with various factors of both the performance of the unidirectional vacuum gauge and the property of the vacuum system. Sharp directivity, high signal to background ratio, and high sensitivity are desirable for the gauge. When the leak rate is far smaller than the total outgassing rate of the system, it is difficult to detect the leak even if one uses the gauge with high performances.
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  • An Effect of Plasma Polymerized Multi-Layer Resist
    Junji TAMANO, Masami ICHIKAWA, Shinzo MORITA, Shuzo HATTORI
    1983 Volume 26 Issue 12 Pages 919-921
    Published: December 20, 1983
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.26.919
    JOURNAL FREE ACCESS
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    The purpose of this paper is to describe a plasma etching characteristic of plasma polymerized multi-layer resist. Plasma polymerized multi-layer resist were formed in multiple flow grow-in after grow reactor. A pattern was delineated in the resist using an electron beam, and it was developed by plasma etching with a mixture of argon and oxygen. It was found that the etching rate of a boundary layer of upper resist and lower resist was smaller than of so on.
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