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26 巻, 6 号
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浦本 上進1983 年 26 巻 6 号 p. 551-555
発行日: 1983/06/20
公開日: 2009/09/29
ジャーナル フリーA simple method for producing curved sheet plasma (with large width and thin thickness) is described, in which two different shapes of permanent magnets are arranged on both sides of a cylindrical plasma column along a magnetic field. Using the curved sheet plasmas for ion plating of curved large surfaces, we can collect an ion current of high density in a very high power and gas efficiency.抄録全体を表示PDF形式でダウンロード (488K) -
矢部 勝昌, 鈴木 正昭, 伊ケ崎 泰宏, 山科 俊郎1983 年 26 巻 6 号 p. 556-562
発行日: 1983/06/20
公開日: 2009/09/29
ジャーナル フリーTo establish quantitative analysis of titanium nitride thin film, several experiments were carried out using X-ray photoelectron spectroscopy (XPS). It was demonstrated that two kinds of relative sensitivity ratio of nitrogen to titanium could be determined using standard materials. The one is the relative sensitivity in the primary meaning and it was determined using secondary standard materials of chemical reagents. The other is the one adoptable for a quantitative analysis accompanying Ar+ ion sputter etching such as depth profiling and it was obtained from measurments on the standard titanium nitride films which were prepared by thermal nitriding and reactive r.f. sputtering. Change in atomic composition of the surface by an Ar+ ion bombardment was investigated. It was found that the ratio of the sputtering yield of nitrogen to that of titanium was constant for the samples having nitrogen composition above 0.5 (atm. %). It is confirmed that the accurate quantitative depth analysis is possible for a sample having composition within that range.抄録全体を表示PDF形式でダウンロード (808K) -
小沼 義治, 加藤 芳健, 中尾 真人, 松島 久夫1983 年 26 巻 6 号 p. 563-570
発行日: 1983/06/20
公開日: 2009/09/29
ジャーナル フリーCarbon films have been prepared by R.F. plasma decomposition of benzene vapour, intending to obtain high conductive films at low decomposition temperature. The surface mophology, structure, IR absorption and electrical properties have been investigated.
By this method, carbon films can be obtained at decomposition temperature range of 4001000°C. Electron transmission microscopy and electron diffraction analysises show that carbon films consist of microfine particles and have graphite like structure. Increasing the decomposition temperature, the intensity of absorption corresponding to the vibration of C-H bonds tends to decrease and the resistivity of carbon films rapidly decrease, owing to the crystallization and evaporation of hydrogen. Conductivity of carbon films prepared at low decomposition temperature rapidly increases with increasing the ambient temperature as like semiconductor. On the other hand, carbon films prepared at high decomposition temperature show weak dependence of conductivity on the ambient temperature as like narrow gap semiconductor, and have p type conduction.抄録全体を表示PDF形式でダウンロード (1068K) -
高橋 隆一, 吉田 順作1983 年 26 巻 6 号 p. 571-576
発行日: 1983/06/20
公開日: 2009/09/29
ジャーナル フリーCo-Cr films were deposited by DC sputtering on pyrex glass and polyimide film. The crystal structure, the composition ratio and the M-H hysteresis loop of the films were investigated by X-ray diffractmeter (XD), Auger electron spectroscopy (AES) and vibrating sample magnetometer (VSM), respectively.
The c-axis of Co-Cr sputtered film is oriented perpendicular to the film plane. The angle of half-width of the rocking curve in (002) plane ranges from 10° to 13°. The Co/Cr atomic ratio (at. %) in the films is 6.7. The existence of oxygen is observed in excess at a thin layer (50Å) near the film surface.
When the perpendicular magnetic field is applied to the film plane, the M-H hysteresis loop (M-H⊥) shows a rectangular loop and its squareness ratio from 0.8 to 0.9 is obtained. Saturation magnetization and coercive force in M-H⊥ are from 580 to 650 emu/cc and from 400 to 600 Oe respectively.抄録全体を表示PDF形式でダウンロード (724K) -
1983 年 26 巻 6 号 p. 598
発行日: 1983年
公開日: 2009/09/29
ジャーナル フリーPDF形式でダウンロード (143K)
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