Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Volume 32, Issue 9
Displaying 1-3 of 3 articles from this issue
  • Moriaki FUYAMA, Masanobu HANAZONO, Makoto MORIJIRI, Katsumi TAMURA
    1989 Volume 32 Issue 9 Pages 697-705
    Published: September 20, 1989
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Fine patterning technology of ITO and Ni on the Cr (Ni/Cr) bilayer film electrode for LCD panel was studied. Hl or HBr solution was found to be the most suitable etching solution for ITO because of small undercutting property.
    For preferential etching for Ni/Cr double bilayer electrode on ITO, mixed solution of CH3COOH-HNO3-H2SO4 H3PO4 was found to be most suitable for Ni film, while for Cr film, Ce (NO3) 4·2NH4NO3 solution was found most suitable. For Ni etching, HNO3 was the most effective component because it shifted the electrode potential to the nobler direction, resulting in an increased etching rate.
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  • Kaoru SHIBATA, Hisayoshi YOSHIDA
    1989 Volume 32 Issue 9 Pages 706-711
    Published: September 20, 1989
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    SiCx alloy films were prepared by r.f. magnetron sputtering of graphite/SiC target in a pure Ar atmosphere. The films prepared on various deposition parameters, such as position of the substrate, r.f. power, and sputtering pressure were studied using X-ray photoelectron spectroscopy and IR transmission spectroscopy as well as Knoop hardness measurements. Microhardness of the films decreased with decreasing r.f. power, and with increasing sputtering pressure. On the contrary oxgen content of the films increased with decreasing r.f. power, and with increasing sputtering pressure. Based on these results and IR spectra the dependence of the microhardness on Si-C bonds was discussed.
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  • Kenya AKAISHI, Satoru SUKENOBU, Akio SAGARA
    1989 Volume 32 Issue 9 Pages 712-720
    Published: September 20, 1989
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Download PDF (1280K)
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