Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 35, Issue 2
Displaying 1-5 of 5 articles from this issue
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  • Charge Exchange Processes Between Hyperthermal Heams (1-20 eV) with Surface
    I. Ionization of Hyperthermal Atoms and Molecules on Surfaces
    Toshihiro FUJII
    1992 Volume 35 Issue 2 Pages 51-57
    Published: February 20, 1992
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.35.51
    JOURNAL FREE ACCESS
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  • Charge Exchange Processes Between Hyperthermal Beams (1-20 eV) with Surface
    II.Induced-Ion Emission and Induced-Electron Emission from Surfaces
    Toshihiro Fujii
    1992 Volume 35 Issue 2 Pages 58-64
    Published: February 20, 1992
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.35.58
    JOURNAL FREE ACCESS
    Download PDF (787K)
  • On the Relative Sensitivity of Hot Cathode Ionization Gauges (2)
    Triode type and B-A type
    Hiroshi MIMA
    1992 Volume 35 Issue 2 Pages 65-69
    Published: February 20, 1992
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.35.65
    JOURNAL FREE ACCESS
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    A new method for the derivation of the relative sensitivity coefficient of a hot cathode ionization gauge, proposed previously, is applied to the triode gauge VS-1 and the B-A gauge UG-1A. The coefficient is obtained from the total ionization cross section of the sample gas with the aid of the (1-V) distribution data relevant to the ionizing electron. The (Vaf-I+) characteristics of the two gauges were measured. The (1-V) distribution of each gauge was calculated with the aid of NNLS (non-negative least square) program. Relative sensitivity coefficients of fifteen gases were calculated for these gauges. The results showed good agreement with the calibrated values.
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  • Development of a High-Vacuum Planar Magnetron Discharge
    Tatsuo ASAMAKI, Tsutomu MIURA, Gen NAKAMURA, Koichi HOTATE, Shingo YON ...
    1992 Volume 35 Issue 2 Pages 70-75
    Published: February 20, 1992
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.35.70
    JOURNAL FREE ACCESS
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    With an eye to high-vacuum magnetron discharge for thin-film technology, sputter ion pumps and vacuum gauges, reduction of the discharge pressure in the conventional planar magnetron is investigated. Several targets having configurations where the wall prevents plasma diffusion are investigated, but are found to be ineffective. Intensification of only the magnetic flux density is also ineffective. However, when both the discharge voltage and the magnetic flux density are intensified to several kV and several hundred mT, respectively, a high-vacuum planar magnetron discharge is sustained, certainly at 0.1 Pa, and even at pressures lower than 10-3 Pa. Discharge intensity (discharge current I/ pressure P) vs magnetic flux density B with discharge voltage V as a parameter shows that this discharge requires B and V higher than about 0.1 T and 2 kV, respectively.
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  • [title in Japanese]
    [in Japanese], [in Japanese], [in Japanese]
    1992 Volume 35 Issue 2 Pages 76-79
    Published: February 20, 1992
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.35.76
    JOURNAL FREE ACCESS
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