巻号一覧
35 巻, 6 号
選択された号の論文の7件中1～7を表示しています
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日野 友明, 橋場 正男, 広畑 優子, 石尾 光太郎, 山科 俊郎1992 年 35 巻 6 号 p. 553-558
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーBoron-doped graphite and a-C/B : H film are regarded as attractive low Z plasma facing materials, since radiation loss due to oxygen and carbon impurities is largely reduced. It is also suggested that the radiation enhanced sublimation (RES) might be reduced by the boron doping. However, suitable temperature range for this material has not yet been clarified. From the oxidation experiments of the boron-doped graphite, it is observed that B2O3 formed by oxygen gettering evaporates at the temperature over 900°C. From the measurement of RES, it is also shown that the boron evaporation becomes dominant when the temperature exceeds approximately 1000°C. In addition, the reduction of the RES yield is not clearly observed in our experiment. Thus it is proposed that the suitable temperature range of boron-doped graphite should be less than about 900°C. The boron-doped graphite can be used only for walls of relatively low temperature, i.e., the first wall region. To extend this material to the divertor region of the fusion experimental reactor such as ITER, the heat flux must be greatly reduced by expanding the divertor configuration.抄録全体を表示PDF形式でダウンロード (887K) -
真壁 保志, 広畑 優子, 日野 友明, 山科 俊郎1992 年 35 巻 6 号 p. 559-566
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーThe structure of Mo films prepared under different deposition conditions was examined in terms of surface morphology (SEM), effective surface area (SRF) and crystallization (XRD). In addition, the spatial distribution of excited species of Mo was measured by optical emission spectroscopy (OES). As the Ar gas pressure increased, the surface roughness of film was enhanced. In addition, the crystallization deteriorated. It was observed that the emission of Mo from plasma sharply decreased around the substrate when the pressure was relatively high. It was presumed that the distribution of the incident angle of Mo particle on the substrate became isotropic at high pressure due to collision with Ar atoms. It was concluded that the surface roughness was enhanced by the collision of sputtered Mo atom with Ar atom.抄録全体を表示PDF形式でダウンロード (968K) -
小原 健二, 安藤 一郎, 吉村 長光1992 年 35 巻 6 号 p. 567-573
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーPumping characteristics of sputter ion pumps with anode-cells of φ 17 mm, φ 24 mm and φ 29 mm, were measured for N2 with three magnetic fields (i.e., 0.15 T, 0.2 T and 0.3 T at the center of the discharge area) in an ultrahigh vacuum range between 1 × 10-8 Pa and 1 × 10-6 Pa. The pumping speed of the pump with φ17 mm cells increased significantly with increasing magnetic fields. However, the pump with φ 17 mm cells and a magnetic field of 0.3 T exhibited negligible pumping speed at pressures <1.5 × 10-8 Pa. The pump with φ 24 mm cells and a magnetic field of 0.3 T showed a fairly high pumping speed in the range between 1 × 10-8 Pa and 1 ×10-6 Pa. The pump with φ 29 mm cells and 0.3 T showed the highest pumping speed at pressures <2 × 10-8 Pa, although its pumping speed in the 10-7 Pa range were comparatively low.抄録全体を表示PDF形式でダウンロード (1132K) -
吉村 長光, 小原 健二, 安藤 一郎, 平野 治男1992 年 35 巻 6 号 p. 574-578
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーAr-pumping characteristics of diode-type sputter ion pumps with various shapes of “Ta/Ti” cathode-pairs were measured by an orifice method. Every pump had 30 anode cells (φ 24 mm, 28 mm in length) and 0.15 T of magnetic flux density at the center of the discharge area. The Ar-pumping speed of the pump of a “flat Ta/flat Ti” cathode-pair was about 13 l/s in the 10-5 Pa range. On the other hand, the Ar-pumping speeds of the pumps of a “holed Ta on flat Ti/flat Ti” cathode pair and of a “slotted Ta on flat Ti/flat Ti” pair were both about 23 l/s in the 10-5 Pa range. The pump of a “slotted Ta on flat Ti/slotted Ti on flat Ti” pair showed the Ar-pumping speed as 2425 l/s, which was a slightly higher than the speed of the pump of the “slotted Ta on flat Ti/flat Ti” pair. The N2-pumping speed of the pump of the “slotted Ta on flat Ti/flat Ti” pair was measured as about 50 l/s in the 10-6 Pa range and about 55 l/s in the 10-5 Pa range. Therefore, the Ar-pumping speed was as high as 42% of the N2-pumping speed for the pump of a “slotted Ta on flat Ti/flat Ti” cathode-pair.抄録全体を表示PDF形式でダウンロード (682K) -
久松 広美, 百瀬 丘, 石丸 肇1992 年 35 巻 6 号 p. 579-582
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーPDF形式でダウンロード (678K) -
犬丸 晋1992 年 35 巻 6 号 p. 583-587
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーPDF形式でダウンロード (1154K) -
土佐 正弘, 吉原 一紘1992 年 35 巻 6 号 p. 588-593
発行日: 1992/06/20
公開日: 2009/10/20
ジャーナル フリーPDF形式でダウンロード (774K)
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