Ion orbits in the quadrupole field were calculated for four stability zones using a matrix method. The orbits were compared with those from the approximate formulae previously obtained. The dependence of maximum ion amplitude on initial phase angle was also calculated for x and y directions for respective zones. It has been found that a condition of the second stability zone at the upper tip is useful in obtaining a high resolution peak.

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This investigation was conducted on the surface modification of glassy carbon (GC) by radio-frequency (13.56 MHz) glow discharge plasmas with the objective of investigating the effects of plasmas on GC surfaces and the mechanism of the elapse variations of the GC surfaces after the plasma treatment. The surface of GC was treated using reactive plasmas (CF₄ and O₂ plasma), and Ar plasma was used for comparison. The contact angles of water to the GC surfaces after the plasma treatment were measured and their elapse changes were investigated. Forthermore, the GC surfaces treated by plasmas were analyzed by ESCA and observed by SEM. Also, Raman spectra on the GC surfaces after the plasma treatment were measured. From these results, the following conclusions can be drawn.
The contact angles to the GC surfaces vary with the treatment of CF₄ (to 135°), O₂ (to 4°) and Ar (to 15°) plasma from the contact angle on the untreated GC surface (90°). However, the contact angles are reduced from 135° to 120° in the case of CF₄ plasma treatment, and are increased in the case of O₂ (from 4° to 20°) and Ar (from 15° to 52°) plasma treatment in air at room temperature for 24 hours. The values of O/C (on the GC surfaces treated by O₂ and Ar plasma) and F/C (on the GC surfaces treated by CF₄ plasma) increase. The half value widths of the Raman band at 1360 cm^-1 on the treated GC surfaces also increase, but their values are reduced in air at room temperature, as time passes.
These findings suggest that the elapse changes in the contact angles to the GC surfaces after the plasma treatment would be induced mainly by the decrease in the number of fluorine atoms (in CF₄ plasma treatment), hydrophilic groups containing oxygen (in O₂ plasma treatment) and active radicals (in Ar plasma treatment).

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We studied the outgassing properties of CVD-SiO₂ films using the throughput method. NSG (nondoped silicate glass) films and PSG (phosphosilicate glass) films with 3.2 to 12.0 wt% phosphorus concentration were investigated. The films were deposited on silicon substrates at 400°C using a reaction of SiH₄, PH₃, and O₂. Etch rates and AFM (atomic force microscopy) images were used for film evaluation. The primary desorption product was water molecules. A desorption peak was measured at about 130°C for the heating rate of 5°C/min. However, the peak was not measured for PSG films with phosphorus concentrations above 6 wt%. Following desorption, the films absorbed water again after exposure to atmosphere at 24±3°C, 40%RH. The desorbed water increased with increasing film thickness and exposure time. It decreased with increasing heat treatment temperature for film densification. We there fore concluded that low temperature CVD-SiO₂ films have a porous structure. The porous structure was also suggested by the etch rates and the AFM images.

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Spinning rotor gauges are used widely as transfer and reference gauges for gauge calibration in high and middle vacuum. Causes of error in pressure measurements by the gauge were discussed. Change in offset was measured and analyzed. A spinning rotor gauge was calibrated from 10^-4 to 1 Pa using another spinning rotor gauge as a reference. The dispersion of measured values was the dominant cause of the uncertainty at pressures less than 10^-2 Pa. The lowest value of the standard deviation was 3×10^-7 Pa. Judging from this value, the lower limit of reliable measurement by the gauge is 3×10^-5 Pa.

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To fabricate highly reflective X-ray mirrors coated with metal films, we have developed a deposition system equipped with an electron cyclotron resonance (ECR) ion source to irradiate a substrate with low-energy ions as well as to sputter the metal target. The ECR ion source has been designed to avoid depositing a metal film onto a microwave-introducing window. This design has enabled us to stably deposit metal films, suggesting wide-area X-ray mirrors. A platinum film with a surface roughness of 0.3 nm has been deposited by means of this equipment, which should ensure high-reflectivity X-ray mirrors.

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