Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Search
Advanced search
OR
Browse
Search
Volume 37, Issue 10
Displaying 1-4 of 4 articles from this issue
Show all abstracts
    • |<
    • <
    • 1
    • >
    • >|
  • Ellipsometric Study on Plasma Oxidation of Silicon
    Masahiro KITAJIMA
    1994 Volume 37 Issue 10 Pages 815-825
    Published: October 20, 1994
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.37.815
    JOURNAL FREE ACCESS
    Download PDF (1712K)
  • Growth of TiO2 Rutile Films at Low Temperature by Reactive Sputtering
    Akira SHIBATA, Kunio OKIMURA, Kakuei MATSUBARA
    1994 Volume 37 Issue 10 Pages 826-832
    Published: October 20, 1994
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.37.826
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Rutile (110) rich TiO2 films were prepared at a low temperature by introducing He gas in reactive sputtering. The optimum gas pressure ratio providing the richest rutile composition to deposited film was He : O2 : Ar =1 : 0.42 : 2.39 for a total gas pressure of 0.27 Pa. The rutile (110) phase was grown by the reaction between sputtered Ti and active oxygen species O2+, O*. The former is generated by the penning ionization of oxygen molecules by He*. The latter is produced from the decomposition process of O2+. This film indicated the greatest crystalline size and the highest refractive index. Furthermore, the film consists of the uniform crystalline sizes of 2030 nm.
    View full abstract
    Download PDF (1162K)
  • Double-Pressure-Gradient-Type PIG Discharge Plasma
    Joshin URAMOTO
    1994 Volume 37 Issue 10 Pages 833-838
    Published: October 20, 1994
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.37.833
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    PIG discharge with two pressure gradients of Ar gas introduced from the cathode region is investigated. The first pressure gradient is maintained by two intermediate electrodes inserted between the cathode region (40 Pa) and the anode region (1.3 Pa), which protects the cathode from bombardment of positive Ar ions and reactive gases in plasma processes. The second pressure gradient is maintained by an anode ring inserted btween the anode region and the main vacuum chamber (4×10-2 Pa), which contributes to the increase of the pressure of Ar gas in the anode region and to producing a high-density plasma by full ionization. The PIG discharge with a magnetic field of about 500 gauss is fired under a discharge current of 100 A and voltage of 70 V. Then, the discharge plasma flow with a high-density (1014/cc) enters the main chamber through a central aperture of the anode ring and is transformed into a sheet plasma flow by a pair of permanent magnets and a weak magnetic field of about 10 gauss in the main chamber. The sheet plasma density and electron temperature are about 3×1011/cc and 13 eV over a surface area of 80cm×60cm and a thickness of 15 cm, which are very useful for development of plasma processes.
    View full abstract
    Download PDF (734K)
  • Outgassing Rates of FRP and Macor
    Kenya AKAISHI, Kazuhiro EZAKI, Yusuke KUBOTA, Osamu MOTOJIMA
    1994 Volume 37 Issue 10 Pages 839-840
    Published: October 20, 1994
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.37.839
    JOURNAL FREE ACCESS
    Download PDF (148K)
    • |<
    • <
    • 1
    • >
    • >|
feedback
 Top