Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Volume 43, Issue 1
Displaying 1-9 of 9 articles from this issue
  • Masahiro AKAIKE
    2000 Volume 43 Issue 1 Pages 1-6
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Osami MORIMIYA
    2000 Volume 43 Issue 1 Pages 7-11
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Tadao KITAMURA, Hisaji SHINOHARA, Masayuki FURUSAWA
    2000 Volume 43 Issue 1 Pages 12-17
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Tetsu SHIOIRI, Mitsutaka HOMMA
    2000 Volume 43 Issue 1 Pages 18-23
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Takashi SATO
    2000 Volume 43 Issue 1 Pages 24-31
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Electromagnetic forces of two spiral type electrodes (type A and type B) in vacuum circuit breakers were analyzed in 3 dimensions by FEM (Finite Element Method). Then, these electromagnetic forces were related to the results of current interrupting ability tests. The analysis showed that an arc was ignited on contact electrode type A experienced 0.3 to 2.9 × 10-7 N/A2 circumferential electromagnetic force and 1.0 to 2.1 × 10-7 N/A2 radial electromagnetic force. An arc was ignited on contact electrode type B also experienced 0.0 to 1.3 × 10-7 N/A2 circumferential electromagnetic force and 1.1 to 2.2 × 10-7 N/A2 radial electromagnetic forces.
    It was concluded from current interrupting tests that electrode type A had an current interrupting ability of 49.0 or 58.6 kA and electrode type B had an ability of 31.2 or 32.7 kA. Comparison of the current interrupting ability with the electromagnetic forces experienced showed the larger the electromagnetic forces, the higher the current interrupting ability.
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  • Toshimasa MARUYAMA, Seiiti MIYAMOTO, Kenichi KOYAMA, Shinji SATO
    2000 Volume 43 Issue 1 Pages 32-36
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    This paper describes an improved insulating rod which is used to drive a moving contact contained in a vacuum vessel.
    The insulating rod used in this study was made of alumina ceramics with Fe-42Ni layer interposed between the ceramics and the connecting hardware, both of which are connected by brazing.
    The Fe-42Ni layer connected both ends of alumina ceramics formed into the shape of shield for reducing the electric field.
    The results of the dielectric test and the electric field calculation indicate that the creeping discharge on ceramics can be prevented by reducing the dielectric strength at the triple junctions.
    Properties of tensile strength influenced by the heat cycle are discussed. The decline of the tensile strength due to the heat treatment during manufacturing process can be reduced by adopting the rod design in which the stress intensity factor of the ceramics is around 0.7 for the fracture toughness.
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  • Koumei BABA, Ruriko HATADA
    2000 Volume 43 Issue 1 Pages 42-47
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Satoru IWAMORI, Shigeki NAKAHARA, Noriyuki YANAGAWA, Mitsuru SADAMOTO
    2000 Volume 43 Issue 1 Pages 48-53
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Oxygen mixed with nitrogen trifluoride (NF3) was used for the gas source of the plasma etching as one of the methods to improve the etch rate of the polyimide (PI) film. In order to investigate the effects of NF3 addition, the surfaces of the PI film were analyzed with x-ray photoelectron spectroscopy (XPS), optical profilometer and Fourier transformation infrared spectrometer (FT-IR). From the results of surface analyses with XPS, the chemical bonding state of the etched PI surface with the 30% NF3/70% O2 plasma was similar to that of the 100% O2 plasma rather than the 80% NF3/20% O2 plasma. Peak intensities of the benzene ring and imide moietiy were decreased, but that of C-OH and carboxyl moiety were increased as etching time was increased. From the observations of surface analyses with optical profilometer, the roughness of the etched PI surface with the 30% NF3/70% O2 plasma was smother than the 100% O2 plasma. From the results of FT-IR, the part of deposition material, which was soluble in chloroform, on the etched PI film was estimated to be carbonyl and ether compounds.
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  • [in Japanese]
    2000 Volume 43 Issue 1 Pages 54-56
    Published: January 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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