Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 50, Issue 6
Displaying 1-13 of 13 articles from this issue
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Special Issue: Simulation of Dry Etching Process
Reviews
Article
  • Three Dimensional Simulation for Inductively Coupled Plasma Reactor Employing Multi-Spiral Coil
    Kei IKEDA, Tomohiro OKUMURA, Vladimir KOLOBOV
    2007 Volume 50 Issue 6 Pages 424-428
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.424
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      Three dimensional plasma simulation is presented and the results are compared with the experimental observations by Langmuir probe for an industrial inductively coupled plasma (ICP) reactor employing multi-spiral coils. In this simulation, gas heating is also taken into consideration since the gas density is inversely proportional to temperature and the effect is not negligible. It is shown that the gas temperature near the susceptor reach at 400K while the chamber is kept at 300 K when the absorbed power of the electron is at 1.5 kW. The elapsed time for one run is about only 85 minutes for Ar and it is quite acceptable as an industrial tool for various plasma processes.
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Product Note
Regular Papers
Review
  • Study on Relationships between Internal Stress and Photodecomposition Properties of Thin Film Titanium Dioxide Photocatalyst
    Amica MIYAMURA, Kenji KANEDA, Yasushi SATO, Yuzo SHIGESATO
    2007 Volume 50 Issue 6 Pages 432-436
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.432
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      Photocatalytic activities of titanium dioxide (TiO2) films deposited by rf sputtering were investigated from view points of their internal stress. TiO2 films were deposited on fused quartz glass or 100 μm thick micro-sheet glass substrates at room temperature, 200 or 400°C under various total gas pressures (Ptot) of 0.3~5.0 Pa with oxygen flow ratio [O2/(O2+Ar)] of 60% using a Ti metal target. Photocatalytic activity was evaluated by photodecomposition of acetaldehyde (CH3CHO) under UV illumination (black light lamp, 0.4 mW/cm2). Compressive internal stress was estimated by cantilever method using the micro-sheet glass, which clearly decreased from -2.1 to -0.1 GPa with the increase in the Ptot from 0.3 to 3.0 Pa. The films with the compressive stress less than -0.5 GPa performed the photocatalytic activity. Furthermore, compressive or tensile stress was applied by external force on the TiO2 films deposited on the curved micro sheet glasses by flattening these substrates after the deposition. The photodecomposition activity of the films with the slight compressive stress improved clearly, whereas the one of the films with the tensile stress degraded.
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Letters
  • Design of Reactive Ion Etching Process Based on ab-initio Calculation
    ∼The First Step∼
    Shigeno MATSUMOTO, Wilson A. T. DIÑO, Melanie Y. DAVID, Rifki M ...
    2007 Volume 50 Issue 6 Pages 437-439
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.437
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      We propose an intricate method of Reactive Ion Etching (RIE) process design for transition-metal (TM) materials using ab-initio calculations.
      The TM materials are inert in dry etching processes since volatile etching by-products cannot be formed easily. However, to achieve new high-performance memories based on the TM materials, a selective dry etching technique such as RIE is eagerly required instead of the conventional ion milling method.
      In this work, we would like to introduce our scenario of the RIE design for TM materials using the results of CoFe as an example.
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  • A Behavior of a Hydrogen Atom of Pd0.75Ag0.25(111)
    Nobuki OZAWA, Hiroshi NAKANISHI, Shinichi KUNIKATA, Hideaki KASAI
    2007 Volume 50 Issue 6 Pages 440-443
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.440
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      In this work, we calculate the adiabatic potential energy for the hydrogen atom on the Pd0.75Ag0.25(111) surface and in the subsurface using the first principles calculations based on the density functional theory. Moreover, we discuss the difference between the behaviors of the hydrogen atom on the Pd(111) and the Pd0.75Ag0.25(111) surfaces by comparing the calculated potential energies. The results show that the potential energy minimum and an energy barrier for the hydrogen atom absorption into the bulk of the Pd0.75Ag0.25(111) are lower than for the Pd(111) surface. It is shown that the potential energy rises when the hydrogen atom is located at a site where the nearest neighbor atoms include Ag atoms. In addition, the potential energy values Pd(111) surface and in the subsurface with lattice constant same as Pd0.75Ag0.25(111), show that the decreasing of the potential energy caused by Ag alloying of the Pd(111) surface and is attributed to the increase of the lattice constant.
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  • Microcrystallization of Amorphous SiC:H Films Prepared by Reactive Sputtering in He
    Nobuo SAITO, Masahiro FUJITA, Hiromu IWATA, Atsushi MANO, Isamu NAKAAK ...
    2007 Volume 50 Issue 6 Pages 444-447
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.444
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      SiC:H films have been deposited by reactive rf magnetron sputtering of Si target in helium and methane (diluted by argon) gas mixtures. The effects of helium partial pressure ratio R on the structural, optical and electrical properties of the films were investigated. With increasing R above 75%, both the optical bandgap and the concentration of hydrogen bonded to silicon atoms decreas, and the dark conductivity increases rapidly. These data imply that the nanocrystallization of SiC:H films could be attained by introducing hellium in the sputtering process.
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  • Stable Operating Condition of Carbon Nanotube Field Electron Emitter for Small Size Scanning Electron Microscope
    Hiroshi SUGA, Teruaki OHNO, Miyuki TANAKA, Yasushiro NISHIOKA, Hiroshi ...
    2007 Volume 50 Issue 6 Pages 448-451
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.448
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      Carbon nanotube (CNT) has unique field emission (FE) properties. CNT can emit electrons in lower vacuum condition than other field emitters.
      Therefore we have investigated its emission properties and developed a small size scanning electron microscope (SEM) equipped with CNT electron emitter that can operate at low extraction voltages at a pressure of 10-3 Pa.
      In order to ensure enough stability for SEM operation, we measured the FE current in various partial pressure condition and numerically analyzed power spectral density function of field emission current by a computer.
      As a result, we have found it very effective to heat an emitter and metal parts around an emitter.
      Finally, we added heating system in a CNT-FE-SEM and succeeded in taking a stable image.
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  • Development of the Radiation-hardened Magnetically Suspended Compound Molecular Pump
    Kaoru WADA, Takashi INOHARA, Masashi IGUCHI, Norio OGIWARA, Keigo MIO, ...
    2007 Volume 50 Issue 6 Pages 452-454
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.452
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      The Magnetically Suspended Compound Molecule Pump is used for the vacuum pumping system in 3 GeV Rapid Cycle Synchrotron (3 GeV-RCS) of Japan Proton Accelerator Research Complex (J-PARC). The pump is demanded a permissible radiation of 10 MGy or more because of operating under the radiation environment. The standard Magnetically Suspended Compound Molecular Pump (TG1300M) is able to operate to only 3.5 MGy under the radiation environment. Therefore, the radiation-hardened Magnetically Suspended Compound Molecular Pump (TG1300MR) was developed based on the result of gamma rays irradiation examination of TG1300M, and irradiation test was done. TG1300MR had a failure of matching error on operation at 34.3 MGy, but it satisfied 10 MGy of 3 GeV-RCS demand doses of radiation enough. As result of disassembly check, cause of the failure is the faulty operation due to the decreased insulation of a connector for magnetic suspension. And every other parts, such as the position sensor, the electromagnet and the motor are with no problem. It means that TG1300MR is able to work under the radiation environment above 34.3 MGy, if the connector for magnetically suspension is improved.
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  • Middle Operating Temperature Property of Solid Oxide Fuel Cell Having SDC Electrolyte Film Grown by Helicon Plasma Sputtering
    Kentaro OKAMURA, Norikazu SASAKI, Takeshi KIMURA, Akiyoshi NAGATA
    2007 Volume 50 Issue 6 Pages 455-457
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.455
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      The operating property at the middle temperature regions from 800°C to 600°C of a single solid oxide fuel cell (SOFC) having a samaria doped ceria (SDC) electrolyte film was studied based on the dependence on the film thickness of SDC electrolyte film grown by the helicon wave excited plasma sputtering. The crystal structure of the sputtered SDC film indicated a columnar one with the lower X-ray diffraction intensity such as being independent of the film thickness. The cell resistance became small at a single cell having thin SDC electrolyte film. Open circuit voltage of a single cell indicated maximum value at the operating temperature of 600°C.
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  • Fabrication of Aluminum Nitride Coatings by Reactive Plasma Spraying and Evaluation of Its Property
    Motohiro YAMADA, ChaeChul LEE, Toshiaki YASUI, Masahiro FUKUMOTO, Koya ...
    2007 Volume 50 Issue 6 Pages 458-461
    Published: 2007
    Released on J-STAGE: January 01, 2008
    DOIhttps://doi.org/10.3131/jvsj.50.458
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      Aluminum nitride (AlN) has excellent properties such as high corrosion resistance, hardness and thermal conductivity. In this study, AlN coatings were fabricated by reactive plasma spraying by using Al-AlN mixed powder for feedstock. The optimal mixing ratio of Al-AlN particles and spray conditions were investigated. Al-AlN particles were injected into Ar/N2 plasma and were deposited onto graphite substrate. It was possible to fabricate the coatings using Al-10∼40 wt.%AlN powders for feedstock. Especially, using Al-20 wt.%AlN and Al-30 wt.%AlN powders enabled to fabricate dense coatings which consisted of almost completely AlN phase. The nitride phase concentration in the coatings was controlled by RF power and N2 gas flow rate in the plasma gas. Furthermore, it became clear that the hardness of the coatings depended on the nitride concentration in the coatings. The thermal conductivity of the coating was achieved 71.2 (W/m•K). Therefore, it was possible to fabricate AlN based coatings with high thermal conductivity by reactive plasma spraying by using Al-AlN mixed powder.
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