The Review of Laser Engineering
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
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Volume 19, Issue 11
Displaying 1-14 of 14 articles from this issue
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  • [title in Japanese]
    Hiroshi HARA
    1991 Volume 19 Issue 11 Pages 985
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_985
    JOURNAL FREE ACCESS
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  • 157 nm F2 Lasers
    Fumihiko KANNARI, Masayuki KAKEHATA, Minoru OBARA
    1991 Volume 19 Issue 11 Pages 986-1008
    Published: November 29, 1991
    Released on J-STAGE: July 30, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_986
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    Current research activities on the electric discharge pumped molecular fluorine lasers at 157 nm, and the present understanding for the laser kinetics are reviewed. Fast and intense discharge excitation, which is more than one order of magnitude higher than excitation rates used for conventional rare-gas halide excimer lasers, improved both output laser energy (100-200 mJ) and efficiency (up to 0.4 %). Successful introduction of cryogenic gas purification that traps various impurity molecules introduced by gases supplied or by secondary reactions during the discharge extended the F2 laser gas lifetime to > 5×105 shots. Further development of high repetition rate high-power exciters, excellent optics with higher damage thresholds, and large aperture and well-controlled low divergence laser beams will open up various useful applications in photochemistry or photo ablation processes.
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  • Recent Progress in Soft X-Ray Laser Development
    Yoshiaki KATO
    1991 Volume 19 Issue 11 Pages 1009-1017
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1009
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    Recent progress in soft x-ray laser development is reviewed. Possibilities in applications of soft x-ray lasers are first described. The perfomances of collisional excitation soft x-ray lasers, at present and in near future, are reviewed. Finally present status of research on other schemes of soft x-ray lasers, including resonant photoexcitation, recombination, and photoionization pumping schemes, are briefly given.
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  • Development of Short Wavelength FEL
    Kazuo IMASAKI
    1991 Volume 19 Issue 11 Pages 1018-1030
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1018
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    Free electron laser (FEL) technology for short wavelengths is reviewed. Key issues of short-wavelength FEL are i) to make a high energy beam in SR, ii ) to obtain a high bright beam onan RF linac, iii) to enhance a high harmonic gain, iv) to develop a microwiggler and a la ser wiggler, and v) to develop optics. These issuls are discussed briefly and an example of industrial applications in short wavelength region as a lithography is noted.
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  • Generation of CW Coherent VUV Radiation
    Masayoshi WATANABE, Kazuhiro HAYASAKA, Hidetsuka IMAJO, Shinji URABE
    1991 Volume 19 Issue 11 Pages 1031-1037
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1031
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    This paper reviews the generation of cw coherent vuv radiation by sum-frequency generation in a nonlinear crystal. Continuous-wave coherent radiation tunable down to 190.8 nm has been generated by sum-frequency generation in a BBO crystal. An output power of 16 μW has been obtained with an external enhancement cavity and a walkoff-compensated configuration of BBO crystals.
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  • Development and Application of Compact SR Ring
    Hiroshi TAKADA
    1991 Volume 19 Issue 11 Pages 1038-1047
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1038
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    Present status of the development and applications of the compact SR rings in Sumitomo Electric Industries Ltd. is summarized. We have been developing the compact SR rings, called NIJI series, dedicated to several applications such as x-ray lithography and photon-induced CVD processes. NIJI-II is a normal conducting ring with straight sections for insertion devices: An Onuki-type polarizing undulator is installed in one of the straight sections at present. NIJI-III, which is the superconducting ring, can provide a wide-exposure area of 50×50 mm2 by using a beam-wobbling method. The compact SR rings are useful for the research on SR applications because of their simple operation.
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  • Laser-Plasma X-Ray Source and X-Ray Microscopy
    Toshihisa TOMIE
    1991 Volume 19 Issue 11 Pages 1048-1056
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1048
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    X-ray microscopy research is reviewed, and the importance of flash exposure for observing detailed structures of living cells is stressed. The comparison of brilliance of various x-ray sources reveals that a laser-produced plasma is presently the best x-ray source for flash x-ray microscopy. The experiment of characterizing a laser-plasma x-ray source is described and the optimum laser irradiation conditions are discussed. A contact flash x-ray image of living sperm of a sea urchin is shown to demonstrate the usefulness of x-ray microscopy.
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  • Inner-Shell Excitaion by Soft-X-ray Radiation from Laser-Produced Plasmas
    Katsumi MIDORIKAWA
    1991 Volume 19 Issue 11 Pages 1057-1065
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1057
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    Photoionozation pumping through inner-shell processes with soft-x-ray radiation from laser produced plasma is reviewed. Avariety of inner-shell excitation scheme and the recent progress in laser produced plasma as a soft x-ray source for photionization pumping are discussed. New-types of pumping geometry for traveling-wave excitaion are also described.
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  • Organic Synthesis and Material Processing with Vacuum Ultraviolet Light
    Akira YABE
    1991 Volume 19 Issue 11 Pages 1066-1072
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1066
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    Preparative organic reactions and material processings with vacuum ultra-violet light were reviewed. As examples of organic syntheses, the highly selective dimerization of bicyclo-alkanes by the ArF excimer laser photolysis of cycloalkanes, and the reactions of hydrocarbons with reactive species formed by VUV-light photolysis were discussed. As examples of material processings, polymer ablation of saturated hydrocarbon polymers, direct reactions on polymer surfaces with reactive species, and modification of polymer surfaces and preparation of polymer thin films by ablation were discussed.
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  • A New Vacuum Ultraviolet F2 Lamp and Its Application
    Hiroshi KUMAGAI, Tai-Jing LU, Koichi TOYODA
    1991 Volume 19 Issue 11 Pages 1073-1081
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1073
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    A new vacuum ultraviolet (vuv) fluorine (F2) lamp excited by continuous-wave microwave discharge was developed and its performance characteristics were investigated. The fluorescent spectrum of the emitted light has its peaks at 157nm, the same as that of a conventional F2 laser, and at 166nm. The vuv fluorescent power was 18.9W, which was obtained with an intrinsic efficiency of 6.2% with a 310W micro-wave power deposition. The lamp was successfully applied to the vuv photo-chemical etching of a thermally oxidized silicon film.
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  • Synchrotron Radiation Excited Semiconductor Processes
    Jun-ichi TAKAHASHI, Yuichi UTSUMI, Housei AKAZAWA, Tsuneo URISU
    1991 Volume 19 Issue 11 Pages 1082-1088
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1082
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    An outline of a synchrotron radiation (SR) excited reaction is given in connection with silicon epitaxy and related surface processes. Experimental results on SR-excited silicon epitaxial growth and surface cleaning using a disilane molecular beam system are presented. Epitaxial growth was attained at a surface temperature as low as 380°C. It is concluded that the growth rate in the low temperature region is limited by hydrogen desorption from the surface due to SR irradiation. The surface cleaning was realized at a surface temperature of 700°C mainly by an SR excited reductive reaction of the silicon surface oxide by disilane molecules.
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  • Atomic and Molecular VUV Spectroscopy Using Synchrotron Radiation
    Kiyoshi UEDA
    1991 Volume 19 Issue 11 Pages 1089-1098
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1089
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    Two typical experiments of atomic and molecular spectroscopic studies using synchrotron radiation, recentry carried out at the Photon Factory, the 2.5 GeV synchrotron radiation facility in Tsukuba, are reviewed. One is a high-resolution measurement of absorption spectra in the autoionization region of Xe and Ca; the high-resolution spectra are compared critically with the ab-initio calculations available in the literature. The other is an extensive study on the decay processes of inner-shell photo-excited BF3; results for photoelectron and Auger electron spectroscopy and energy-analyzed-electron-photoion coinincidence measurement are presented together with the detailed discussion of the decay processes of the B:K-shell hole created by soft X rays.
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  • High-Order Harmonic Generation in the Soft X-Ray-XUV Regions with Ultrashort Laser Pulses
    Kenzo MIYAZAKI, Hirofumi SAKAI
    1991 Volume 19 Issue 11 Pages 1099-1109
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_1099
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    A systematic study of high-order harmonic generation in rare gases has been made with intense (2 × 1014 W/cm22, 616 nm) dye laser pulses, where the harmonic radiation up to the 41st order (15.0 nm) in He, the 37th (16.6 nm) in Ne, the 19th (32.4 nm) in Ar, , the 17th (36.2 nm) in Kr, and 13th (47.4 nm) in Xe was observed. The harmonic distributions obtained represent a plateau that is preceded by an intensity minimum and formed from an energy region near the ionization limit. The dynamic resonances and shifting ionization limit due to the ac Stark effect at high laser intensity are proposed and discussed to illustrate the plateau formation process observed.
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  • [title in Japanese]
    [in Japanese]
    1991 Volume 19 Issue 11 Pages i
    Published: November 29, 1991
    Released on J-STAGE: February 26, 2010
    DOIhttps://doi.org/10.2184/lsj.19.11_i
    JOURNAL FREE ACCESS
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