The Review of Laser Engineering
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
Search
Advanced search
OR
Browse
Search
Volume 30, Issue 5
Displaying 1-8 of 8 articles from this issue
Show all abstracts
    • |<
    • <
    • 1
    • >
    • >|
Topical Papers on Femtosecond Laser Microfabrication of Non-Organic Materials
Topical Paper
Laser Reviews
  • Preface to the Topical Papers on Femtosecond Laser Microfabrication of Non-Organic Materials
    Kunihiko WASHIO
    2002 Volume 30 Issue 5 Pages 220
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.220
    JOURNAL FREE ACCESS
    Download PDF (132K)
  • Precise Structuring Using Femtosecond Lasers
    Andreas OSTENDORF
    2002 Volume 30 Issue 5 Pages 221-225
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.221
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Femtosecond (fs) lasers are perfect laser sources for material processing when highest accuracy and smallest structure sizes are required. Due to the ultrashort interaction time and the high peak power the process is generally characterized by the absence of heat diffusion and, consequently, molten layers. Moreover, the process is nearly independent of the material and recent results demonstrate the possibility to ablate material with sub-μm accuracy or even nm dimension while maintaining an outstanding reproducibility. Also, certain technically important materials like metals with high heat conductivity, semiconductors, and dielectrics with high transparency in the visible and uv can be processed by fs laser pulses which have been unable to machine so far with conventional laser radiation. In contrast to longer laser pulses, the absorption and ablation process can be described in a more simple way resulting in a higher reproducibility and controlability of the process.
    Besides the microelectronics industry there are numerous potential applications in the field of automotive supplier industry, medicine technology and finally telecommunication.
    View full abstract
    Download PDF (1629K)
  • Comparison between DUV/VUV and Femtosecond Laser Processing of Dielectrics and Semiconductors
    Koji SUGIOKA
    2002 Volume 30 Issue 5 Pages 226-232
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.226
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Both of DUV/VUV and femtosecond lasers are expected as novel tools for materials processing for the next generation. DUV/VUV laser is good at surface micropatterning and surface shaping, while femtosecond laser is suitable for internal modification of transparent materials as well as micro-hole drilling, cutting and high aspect ratio machining. In this paper, precison microfabrication of dielectrics and semiconductors using DUV/VUV and femtosecond lasers are reviewed, and features of each laser processing are compared.
    View full abstract
    Download PDF (2393K)
  • Creation and Applications of Micropattern Inside Transparent Materials Using a Femtosecond Laser
    Jianrong QIU, Kazuyuki HIRAO
    2002 Volume 30 Issue 5 Pages 233-238
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.233
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Femtosecond laser is a powerful tool to make 3-dimensional microscopic modifications in transparent materials due to its ultrashort laser pulse and ultrahigh strength of electric field. In this paper, we report on femtosecond laser-induced microstructures and novel optical functions of transparent materials. We demonstrated space-selective introduction of microcrack, manipulation of defect and valence state of active ions, formation of optical waveguide array and micrograting inside glasses by a 800 nm femtosecond laser.
    View full abstract
    Download PDF (2221K)
  • Functionalization of Transparent Dielectric Materials by Femtosecond Fabrication with Super-Resolution
    Hiroaki MISAWA
    2002 Volume 30 Issue 5 Pages 239-243
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.239
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Functionalization of dielectric materials such as crystals, glasses (silica-related or polymers), and liquid polymerizable resins by femtosecond (100-500 fs) irradiation is summarized. The modification was carried out by employing tight focusing optics with numerical aperture typically NA > 0.6. This allows to produce 3D optical memory and photonic crystals (PhC) by implementing a principle of the focal spot scanning inside silica glass or polymerizable resin. PhCs can be also fabricated by encoding the 3D hologram in negative polymer photoresist. Optically modified regions of dielectric were found to respond sensitively to wet etching. The contrast in the etching rate is over 50, which makes it possible to fabricate 3D channels for microfluidics inside dielectrics.
    View full abstract
    Download PDF (635K)
  • Fabrication of Micro-Gratings on Inorganic Materials by Two-Beam Holographic Method Using Infrared Femtosecond Laser Pulses
    Ken-ichi KAWAMURA, Masahiro HIRANO, Hideo HOSONO
    2002 Volume 30 Issue 5 Pages 244-250
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.244
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    This paper describes the nanomachining of inorganic materials by two-beam holographic method using high peak power infrared femtosecond laser pulses. Micro-grating structures can be holographically encoded in any type of materials by colliding a pair of pulses split from a single femtosecond laser pulse. We also describe the periodic nano-structure array in crossed holographic gratings on silica glass by two femtosecond laser pulses. A variety of periodic nano-structures from a one-dimensional wire array to two-dimensional arrays of hole or island were formed by changing the energy density and the incident angle of the irradiation laser beams.
    View full abstract
    Download PDF (1322K)
Laser Original
  • Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser
    Hikaru KOUTA, Yutaka URINO, Tadahiko HANADA, Kazuyuki HIRAO
    2002 Volume 30 Issue 5 Pages 251-254
    Published: May 15, 2002
    Released on J-STAGE: October 21, 2009
    DOIhttps://doi.org/10.2184/lsj.30.251
    JOURNAL FREE ACCESS
    Show abstractHide abstract
    Reported here is the use of the focused beam of an infrared ultrashort pulse laser (150 femtoseconds pulse width, 200 kHz repetition rate, 800 nm wavelength, and 100 μm/s scanning speed) to increase the refractive index of a germanium-doped silica-glass planar waveguide. The increase obtained, Δn, itself increases in proportion to increases in the laser intensity of the surface irradiation, and it saturates to 1.6 ∼ 1.8 × 10-3 at 2.2 TW/cm2, without producing any increase in insertion loss and birefringence. Further, no decay in the refractive index change is observed after annealing at 200 °C for 10 hours. Results show that ultrashort pulse lasers are more suitable than UV lasers as light sources for highly stable adjustment of the optical lengths of waveguide devices.
    View full abstract
    Download PDF (143K)
Regular Paper
Laser Original
    • |<
    • <
    • 1
    • >
    • >|
feedback
 Top