レーザー研究
Online ISSN : 1349-6603
Print ISSN : 0387-0200
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32 巻 , 12 号
選択された号の論文の13件中1~13を表示しています
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「極端紫外リソグラフィー光源開発の最前線」特集号
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レーザー解説
レーザーオリジナル
  • 近藤 公伯, 三浦 永祐
    32 巻 (2004) 12 号 p. 779-785
    公開日: 2010/01/12
    ジャーナル フリー
    The property of extreme ultraviolet (EUV) generation from clusters irradiated with ultrashort intense lasers was studied. The cluster jet was well characterized by the interferometric method and the measurement of Rayleigh scattered light. Conversion efficiency of over 1.1 %/str was achieved with an Xe cluster jet irradiated by a sub-picosecond KrF laser pulse. This method is considered one of the most attractive methods of generating EUV light under debris free conditions. Based on the dependence of the wavelength and the pulse duration on EUV generation, a sub-picosecond UV pulse was found most suitable. By reducing the temperature of the gas, comparatively large clusters can be obtained, even for Kr. So they can also become an efficient EUV converter.
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  • 中島 一久
    32 巻 (2004) 12 号 p. 786-792
    公開日: 2010/01/12
    ジャーナル フリー
    We developed laser-produced plasma X-ray sources using femtosecond laser pulses at 10 Hz repetition rate in a table-top size to investigate basic mechanism of X-ray emission from laser-matter interactions and its application to an X-ray microscope. In a soft X-ray region, laser-plasma X-ray emission from a solid target achieved an intense flux of photons of the order of 1011 photons/rad per pulse with duration of a few hundreds ps, which is intense enough to make a clear imaging in a short time exposure. As an application of laser-produced plasma X-ray source, we developed soft X-ray imaging microscope operating at the wavelength of 13.9 nm. The microscope consists of a cylindrically ellipsoidal condenser mirror and a Schwarzschild objective mirror with highly-reflective multilayer. We report results of performance tests and biological cell observations of the soft X-ray imaging microscope with a compact laser-produced plasma X-ray source.
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  • 富江 敏尚, 錦織 健太郎, 李 東勳, 林 景全, 松嶋 功, 森脇 大樹, 屋代 英彦
    32 巻 (2004) 12 号 p. 793-798
    公開日: 2010/01/12
    ジャーナル フリー
    Photoelectron spectroscopy gives information on electronic states of materials which control properties of materials and devices. Developments of EUV optics and high brilliant pulsed EUV sources in these days have enabled us to develop a new photoelectron spectroscopy, EUPS. With EUPS, we can achieve sub-μm spatial resolution, which is more than one order of magnitude better than that of a commercial XPS. EUPS can observe one mono-layer surface, and ultra-fast phenomena. In this article, after explaining the principle of EUPS, experimental results on observation of chemical shifts, detection of ultra-low level contamination, observation of laser ablation are described. Studies for improving spatial resolution and energy resolution of EUPS are also described.
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  • 西村 靖彦, 高橋 全, 坂田 篤, 東 博純, 山口 直洋, 原 民夫
    32 巻 (2004) 12 号 p. 799-805
    公開日: 2010/01/12
    ジャーナル フリー
    A photoelectron spectromicroscope with a monochromatized laser-produced plasma EUV light source has been developed, and its performance was investigated. The monochromatized laser-produced plasma EUV light source can operate at 50 Hz repetition rate. First, various experiments were carried out to investigate the characteristics of this EUV light source. When an aluminum tape-target was used to produce 13 nm radiation, it was observed that there exists an optimal irradiation intensity of the laser beam for excitation. It turns out that the power density ranging from 400 GW/cm2 to 500 GW/cm2 on a target is required. Besides, a spatial distribution of the main spectral line radiation was measured in the cross sectional view to the plasma. It was found that there was a region where the 13 nm radiation is dominant, which exists at the position about 1 mm away from the target surface. Moreover, the absolute radiation intensity of the 13 nm radiation in the EUV light source was measured and estimated to be 4 [mJ/2πsr/±2 %BW/pulse]. Then, by using this developed photoelectron spectromicroscope, photoelectron spectrum observation has been performed. When a GaAs wafer was used as a sample, photoelectron spectra of Ga-3d and As-3d in GaAs were observed. At present, spatial resolution of less than about 5 μm could be obtained. This result shows that the developed photoelectron spectromicroscope can be applied to valence-band electron analysis successfully.
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  • 村井 健介
    32 巻 (2004) 12 号 p. 806-811
    公開日: 2010/01/12
    ジャーナル フリー
    In this paper, the possibility of a new deposition technique named Laser Plasma Assisted Deposition (LPAD) is explained. It is indicated that photoelectrons on the glass surface were excited due to VUV emissions from the double-stream gas-puff target. The excitation remains for a longer decay time than the irradiated laser pulse width. According to the experimental results, the new binding condition would be created with other particle beams from the evaporator during the excited period with the LPAD technique.
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一般論文
レーザーオリジナル
  • 波多野 智, 伊藤 聡, 吉村 政志, 森 勇介, 佐々木 孝友
    32 巻 (2004) 12 号 p. 812-817
    公開日: 2010/01/12
    ジャーナル フリー
    GdYCOB is a promising nonlinear optical crystal that possesses characteristics of an effective nonlinear coefficient, noncritical phase matching operation, and high chemical stability. In this paper, we report about fabrication and characteristics of a monolithic wavelength converter, which generates ultraviolet light by the incidence of near infrared laser. The converter consists of GdYCOB for third-harmonic generation, KTP for second-harmonic generation, and a wave plate for polarization-control. These constituents are integrated with an optical contact bonding. The extreme downsizing of ultraviolet generator is possible with this converter as compared to the conventional method. GdYCOB has the advantage of wide angular bandwidth whereas KTP exhibits wide temperature bandwidth. Consequently, the combination of these crystals results in highly efficient and stable ultraviolet conversion. The converter does not necessitate any high-temperature curing or desiccators since the constituent crystals are non-hygroscopic. Thus the monolithic wavelength converter enables a very compact and highly reliable ultraviolet laser.
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