X-ray ablation has been recently achieved using plasma soft X-ray lasers, laser plasma soft X-rays, and
X-ray free electron lasers. Nanosecond laser plasma soft X-rays sources allow us to fabricate highquality
micro- and nano-structures of poly (methylmethacrylate) (PMMA), poly (dimethylsiloxane)
(PDMS), and SiO
2. Even after the soft X-ray irradiation, the surfaces of these materials have the same
chemical structures as those of unirradiated surfaces. We found that ablation of SiO
2 occurs more
efficiently than linear optical absorption and energy accumulation to break all of the bonds in SiO
2
surfaces. Picosecond plasma soft X-ray laser sources allow us to ablate LiF crystals at a low threshold
fluence. The ablation is explained in terms of spallative ablation, that is, removal of a surface layer by
tensile stress induced by the short-pulse X-ray irradiation, without breaking the layer into atomic species.
It should be noted that nanostructures such as nano-cones on Al surfaces can be fabricated by irradiation
with the plasma soft X-ray laser light
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