There are various techniques to make holes or grooves in metal or glass plates. One of these techniques is the Photo-Fabrication. The Photo-Fabrication is the most suitable technique for manufacturing electronic parts and micro machinery parts which require very precise results without burrs, chips or changing the original material characteristics. The first step of the Photo-Fabrication process consists of making the desired pattern images on the surface of the objects by exposing photo or electron beam resists. This technique is called photo-lithography in which the shapes and locations of the patterns are highly dependent upon the resist pattern quality and the fabrication process. Experiences in utilizing this technique have proven that very complicated patterns with high dimensional accuracy can be obtained. The Photo-Fabrication techniques introduced almost 30years ago. During this period, various materials and application techniques have been developed and improved. As the result the Photo-Fabrication techniques have made a tremendous growth in the field of micro fabrication process.

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Recently many electronic products are tending to become small, light weighted and to have multi functions. To meet these requirements the Photo-Fabrication techniques have been developed. In this paper, we describe the Exposure Process of the Photo-Fabrication in microprocessing technology. The examples of typical electronic products are as follows: 1. Shadow mask and Aperture grille for Color TV 2. Lead Frame 3. Metal Mesh 4. Parts for Tape Carrier.

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A peeling test method was designed for obtaining reproducible experimental data in regard to undesirable intaglio ink adhesion to a substrate accumulated over the printed specimen after printing. The test specimen was placed on the ink applied to a printing paper, and was peeled off after being pressed by a stack of paper for a given period of time. Using this technique, the non-offset characteristic of the ink was found to be improved remarkably with elevated temperature, and was attained to a satisfactory level at ink application temperature above 80°C. Melting and recrystallization behavior of the wax component in the ink through the sequencical printing process from heating the ink at the inker to piling the printed sheets at room temperature after printing was assumed to play an important role in this property. The wax component in a solid state in printed lines would protect the liquid varnish from exudation and subsequent penetration into the paper under which the test sample had been placed. Therefore, it is assumed that the non-offset can be achieved if the liquid varnish forms thin film at the surface of the ink before it exudes from the printed lines.

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Mixed addition of both erythrosine (ES) and N-phenylthioacridone (TA) is effective to sensitize azides, though ES has no effect in sensitization of azides. This super additivity in sensitization suggests a complex formation between ES and TA. Then, the interaction between both compounds was investigated by spectroscopic measurements in absorption and emission. Addition of TA to ES in ethanol gives a new absorption band near at 600nm. The new band is caused by a complex formation between ES and TA. The complex absorption can not be observed in a case between ES and N-phenylacridone (PA) which has almost the same chemical structure as TA except of a difference between oxygen and sulfur atom. This fact indicates an important role of sulfur atom in the structure for the complex formation between ES and TA. The Benesi-Hildebrand equation for the complex absorption gives the molecular extinction coefficient of the complex to be 9430 (mol/l)^-1cm^-1 and the association constant to be 279 (mol/l)^-1. In order to confirm the complex formation, the fluorescence quenching of ES by addition of TA was also investigated. The Stern Volmer plots showed a linear relation in the low concentration region of TA, and stronger quenching in the high concentration than that expected from the relation. The slope for the Stern Volmer plots gave the association constant between ES and TA to be 290 (mol/l)^-1. The resulted value was well coincident with the value estimated from the absorption spectruum of the associated complex. The temperature dependence of fluorescence quenching for the associated complex indicated -38.24kJ mol^-1 for ΔH_c and -81.21J mol^-1K^-1 for ΔS_c. Thus, the fluorescence quenching and the complex formation support existence of a strong interaction between ES and TA. It is concluded that the complex formation is a main reason for the super additivity in sensitization of azides by ES and TA.

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This paper presents a new pre-press image data compression technique nsing false contour smoothing for color quantized image. Our proposed technique processes original full color images along raster scan line and consists of two processes which are color image quantization process and pixel exchanging dither process. Color quantization process makes data compression of color images and pixel exchanging dither process makes false contour smoothing. These algorithms are very simple but very effective. This paper shows our proposed methods and many experimental results concerning full color pre-press images.

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This paper is intended for the engineers to study the basic digital techniques applicable for the hardware and/or software designs of electronic imaging systems. In Chapter 2, the objectives of image processing in hard-copy system are briefly summarized. In Chapter 3, we discuss the fundamental relationships between picture specifications and human-vision factors. Chapter 4 and 5 include the methods for manipulating pixel values individually and also with its neigbours, which are mostly used for image quality controls such as tonal conversion, edge-enhancement, and noise reduction. In the successive Chapters, the coordinate conversion techniques of pixels, digital halftoning and color reproduction algorithms are to be presented in the next issues.

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To get the real image of samples from microdensitometer curves, the line spread function of microdensitometer (or measurement process) must be decided correctly. Especially, to calculate the convolution by using the line spread function, the precise center of it have to be decided. We tried to find out the line spread function from microdensitometer curves by using the Fourier transform, and got the precise form and center of it. We have used the line spread function obtained in such way and have been able to get the real image of sample.

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