Photopolymerization is commonly applied to printing plate, dry film resist, non-silver lith film and so on. Their photosensitive characteristics depend upon a lot of factors, e. g. composition of photosensitive layer, compatibility of its constituents and film forming method. The effect of film forming method on the photosensitive characteristics of the photopolymerization type non-silver lith film the photosensitive layer of which contained dispersed carbon black was investigated. Its sensitivility and γ value depend upon the drying condition such as drying temperature and the direction of hot blast in the drier. It was found that the vertical concentration distribution of crosslinking agent and sensitizer which strongly affect on the sensitivity and which are mobile in the photosensitive layer was effected by the drying condition. Furthermore, we discovered that there was a good correlation between their vertical concentration distribution and sensitivity and γ value. Namely, the variation of photosensitive characteristics of non-silver lith film by the drying condition is ascribed to the difference of the vertical sensitivity distribution in the photosensitive layer. This conclusion was confirmed by simulation method.
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