A trifunctional vinyl ether urethane monomer (TVU) was synthesized from toluene 2, 4-diisocyanate (TDI), 2-hydroxyethylvinyl ether and 1, 1, 1-tris (hydroxymethyl) propane (THMP). The photoresponsivity of two-component layer consisting of TVU and iodonium 8-anilinonaphthalene-1-sulfonate (DPI·ANS) was discussed. A study using several polymer matrices to incorporate TVU into chemical amplification photoresists in the presence of photoacid generator is presented. Poly-(methylmethacrylate) (PMMA), poly-(methylmethacrylate-co-acrylic acid) (P (MMA-co-AA)), poly (
p-hydroxystyrene) (PHS) were used as the polymer matrices. Results from type variations of the polymer matrix, composition ratio variations in photoresist and changes of the process condition gave insights into the characteristic behaviors of the photoresist systems.
View full abstract