The formation of hydrophilic siliceous film on copper surface by the electrolysis of potassium silicate solution was investigated in order to produce the lithographic printing plate where the electrodeposited siliceous film acts as a nonimage area. Siliceous films were electrodeposited on copper surface in various potassium silicate electrolytic solutions that differ in SiO
2/K
2O ratio (formula ratio: 2.1, 3.4, 3.9) and concentration (5-20%). Applied bath voltages were 3-10V. Ink receptivity of the electrodeposited films were evaluated and infrared spectra of the electrodeposited films were measured. The summary of the results is shown below. Hydrophilic siliceous films tend to be formed in the electrolytic solutions of high SiO
2/K
2O ratio and high concentration. For high SiO
2/K
2O ratio the films are cracked and tend to peel off. Printing test was made by using the copper plate surface on which siliceous film is electrodeposited as a non-image area.
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