The scanning electron micro probe method is a useful method in performing electron probe microanalysis of materials.
In taking the electron beam scanning pattern, however, it is necessary to set up a suitable photographing condition, which is governed by the following factors: the operative voltage, specimen current, scanning speed of electron beam, brightness of oscilloscope used etc.
This paper presents an apparatus for the determination of the best condition for photographing an X-ray or electron image of the surface of specimen under a given state.
It is shown from some experiments that a very clear X-ray image can be taken by using the present apparatus.
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