The techniques for manufacture of In
2O
3 films which have the most excellent properties for applications as transparent conductors and heat mirrors are reviewed, and reported mainly on the vacuum deposition method developed by the authors. The best result can be obtained by electron-beam evaporation of In
2O
3 mixed with SnO
2, WO
3 or MoO
3. The deposited films have resistivity of 2×10
-4Ω•cm, visible transmittance of about 90% and IR reflectance of 90%. The one doped with WO
3 or MoO
3 show steep step-up of IR reflection at λ
p of about 2μm because of its large Hall mobility near 100cm
2/V•s. Besides, the techniques concerning 3-layer anti-reflection coatings together with MgF
2 and CeF
3 films and the deposition onto a large sized glass plate are described.
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