The surface structure of sputter-etched polytetrafluoroethylene using radio frequency glow discharge have been studied. The sputter etching treatment produces microscopic cones and changes the chemical bond in the surface, resulting in an improvement of adhesive prop-erty and wettability. The correlation between change in the surface structure and changes in the surface properties are investigated and it is shown that the surface texture of microscopic cones mainly contributes to those changes in the surface properties.
We report the results of examination for nitrogen concentration in a-Si: H films mea-sured by secondary ion mass spectrometry (SIMS). It is very difficult to measure accu-rately the concentration of elements such as Be, N, Ne and so on which have extremely low electron affinity by SIMS as secondary negatively charged ions. It is, however, shown in this report that the nitrogen con-centration in a-Si: H films can be measured by SIMS as molecular ions of SiN-.