Journal of The Society of Photographic Science and Technology of Japan
Online ISSN : 1884-5932
Print ISSN : 0369-5662
ISSN-L : 0369-5662
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Volume 50, Issue 6
Displaying 1-9 of 9 articles from this issue
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  • [title in Japanese]
    [in Japanese]
    1987 Volume 50 Issue 6 Pages 457
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.457
    JOURNAL FREE ACCESS
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  • The Photoexcited State of Silver Halide Photographic Emulsion Grains
    Tomoyuki NAKAYAMA
    1987 Volume 50 Issue 6 Pages 459-464
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.459
    JOURNAL FREE ACCESS
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  • Fogging Photographs Showing Electric Field
    Masaru NAKAMURA, Mitsuo KAWASAKI, Hiroshi HADA
    1987 Volume 50 Issue 6 Pages 465-469
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.465
    JOURNAL FREE ACCESS
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    We introduce fogging photography, a new method for recording electric field distribution. When a photographic film is exposed to short light flash synchronized with strong applied electric field, the optical density of developed film is significantly decreased depending on the field strength. Based on this phenomenon the image of non-uniform electric field can be easily obtained. For the purpose of basic understanding of the underlying mechanism as well as for f urther application of the method, density decrease vs. applied voltage relationship and the effect of time-lag between the synchronized fogging flash and the voltage pulse were studied under uniform fields. The decay rate of Dember photovoltage was also measured for comparison. We concluded that unfavorable separation of photoelectrons and interstitial silver ions might be a principal cause of the desensitization by the electric field.
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  • Detection of Latent Image Speck by Photoelectric Effects
    Akira HASEGAWA, Tsutomu KUMAZUMI, Koichi IINO, Tomiya SAKAGUCHI
    1987 Volume 50 Issue 6 Pages 470-475
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.470
    JOURNAL FREE ACCESS
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    The latent image speck in AgBr emulsion grain was detected by the measurements of the photoelectric effects: the microwave photoconductivity and the photovoltage due to the Dember effect. The microwave photoconductivity of the grains exposed to saturation region on D-log H curve decreased to less than one-tenth of the value of unexposed grains. The decrease of Dember photovoltage, however, was about one half. These results can be explained on the assumption that the latent image speck acts as the deep electron trap and that its function is recovered through the combination with the interstitial silver ion.
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  • Photosensitivities of Water Soluble Photopolymers with Pendant Nitro Substituted Benzalacetophenone Groups
    Hidetoshi TAKAO, Yoichi NAMARIYAMA, Akihiro KINOSHITA, Kenichiro NAKAM ...
    1987 Volume 50 Issue 6 Pages 476-481
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.476
    JOURNAL FREE ACCESS
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    Photopolymers containing carboxyl groups as water soluble groups and o, m or p-nitro substituted benzalacetophenone (o-BAp·NO2, m-BAp·NO2, p-BAp·NO2) as sensitive groups are synthesized by condensing 4-(vinylbenzyloxy) acetophenone-co-methacryic acid copolymer with o, m or p-nitro substituted benzaldehyde in alkaline catalyzer.
    These condensation polymers were effectively crosslinked by the irradiation of UV light.
    Alkaline aqueous developing solution available commercially for negative type presensitized plate can be applied for development of these photopolymers.
    Relative sensitivities of the condensation polymers in film state were measured. It is found that order of sensitivity of the synthesized polymers are o-BAp·NO2<m-BAp·NO2<p-BAp·NO2.
    The spectral sensitivities of p-BAp·NO2 were observed to be 0.03-0.05 mJ/cm2 at 300-400 nm respectively.
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  • Proceeding of the 43th Regular Meeting of Photographic Science-On Sulfur Sensitization
    Tadaaki TANI
    1987 Volume 50 Issue 6 Pages 482
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.482
    JOURNAL FREE ACCESS
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  • Sulfur Sensitization of Large Crystals of AgCl Doped with Sulfur in the Melt
    Sanemi SONOIKE
    1987 Volume 50 Issue 6 Pages 483-491
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.483
    JOURNAL FREE ACCESS
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    A brief review of the studies performed in the author's laboratory on the sulfur sensitization is given. The studies are now in progress and the results up to date are also introduced with some speculations. The sensitization is mainly studied with large crystals of AgCl pulled up from the melt doped with sulfide. Then the purpose of the studies mainly aims to explain the physical properties of the doped crystals in terms of the structure of sulfur centers in AgCl which undergoes many complex transformations during the photographic processes.
    A hypothetical mechanism of the sulfur sensitization in large crystals of AgCl is also given, where the silver sulfide is introduced in several forms in the crystal depending on the different conditions of the treatment, and S2--interstitial silver ion compexes are considered hole traps and S2--halogen ion vacancy complexes electron traps in order to explain the successive experimental results so far obtained.
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  • Influence of Tetraazaindene on Sulfur-sensitization Center Formation Processes with Thiosulfate
    Hideki TAKIGUCHI
    1987 Volume 50 Issue 6 Pages 492-498
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.492
    JOURNAL FREE ACCESS
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  • The Effect of Sulfur-Sensitization upon the Processes of Spectral Sensitization
    Mikio IHAMA, Tadaaki TANI
    1987 Volume 50 Issue 6 Pages 499-504
    Published: December 28, 1987
    Released on J-STAGE: August 11, 2011
    DOIhttps://doi.org/10.11454/photogrst1964.50.499
    JOURNAL FREE ACCESS
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    Studies on the mechanism of desensitization by dyes have been mainly done by use of chemically unsensitized emulsion in the past, and revealed that (1) retardation of development, (2) electron trapping, and (3) hole trapping by dyes were the main causes for the desensitization by dyes. On the other hand, we have proposed a new mechanism for the desensitization by a cyanine dye in sulfur-sensitized cubic AgBr emulsion, according to which the desensitization is caused by enhancement of dispersion of latent images by dyes. The effect of sulfur-sensitization upon the processes of spectral sensitization is also discussed in this paper.
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