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Volume 52 (1989)
- Issue 6 Pages 507-
- Issue 5 Pages 375-
- Issue 4 Pages 291-
- Issue 3 Pages 201-
- Issue 2 Pages 107-
- Issue 1 Pages 1-
Volume 52, Issue 3
Displaying 1-11 of 11 articles from this issue
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[in Japanese]1989 Volume 52 Issue 3 Pages 201
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
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Tadaaki TANI1989 Volume 52 Issue 3 Pages 203
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
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T. H. James1989 Volume 52 Issue 3 Pages 204-206
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
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T. H. James1989 Volume 52 Issue 3 Pages 207-217
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
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Tadaaki TANI, Yasushi OHISHI1989 Volume 52 Issue 3 Pages 218-222
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSThe analysis on the present status of photography has indicated that silver halide photographic systems are supported by the twin technologies based on silver halide microcrystals associated with outstanding performance of latent image centers as mesoscopic metal clusters and on organic functional compounds. Since those technologies are fine and highly composite, silver halide photographic systems are now, and will continue to predominate over other systems for taking a picture, making progresses in the future.View full abstractDownload PDF (3223K) -
Akira ISHIKAWA, Katsuki MIYAUCHI, Tetsuichi KUDO1989 Volume 52 Issue 3 Pages 223-230
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSWe have reviewed the characteristics of the inorganic resist materials, focusing on their high resolution features. The inorganic resists are used as the top layer in the two-layer lithography, which will become a major technology for the submicron-pattern fabrication in the future ULSI process. Among several inorganic resists, Ag/Se-Ge system and polytungsticacids (HPA) are excellent because they show high resist contrast. Vacuum evaporated Se-Ge film becomes insoluble by the photodoping of surface Ag into the Se-Ge film. On exposure, the photo-bleaching and edge sharpening are found to be occurred. Moreover, Se-Ge film is etched anisotropically on the development, as the film has the phase separated columner structure. Due to these distinctive effects, Ag/Se-Ge system shows high contrast with the γ value of 8. This system needs improvement in the patterning process because the procedure is rather complicated compared to the scheme used for the conventional organic resist system. On the other hand, HPA is well suited for the application to the practical LSI process as it is spin-coatable on the several substrates. HPA is synthesized by the direct reaction of tungsten or tungsten carbide with the hydrogen peroxide. Its polyanion has the network structure made of WO6 octahedra, which becomes insoluble on exposure of the deep UV, electron beam, x-ray or ion beam. The sensitivity of HPA is increased by Nb- or Ta-doping to HPA. Ta-doped HPA shows high electron beam sensitivity among the inorganic resists which is almost same value as the practically used organic resist. Moreover, HPA shows strong oxygen plasma durability, which makes it possible to create 0.2μm line and space patterns using the two-layer resist process.View full abstractDownload PDF (6530K) -
Toshio MIYAGAWA, Yasuo SHIRAI, Reiji DANKI, Akihiko KASHIMOTO, Osamu H ...1989 Volume 52 Issue 3 Pages 231-240
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSKohsai Udagawa (1821-1887) was one of scientists in Japan. He lived from the last days of the Tokugawa shogunate to the early days of the Meiji era. Present paper is about interpretation of his manuscript concerning Niépceotype albumen wet plate photography, named “Potokarahii” and the results of experiment on the process. It was supposed that the old document was a translation from a Dutch technical book. It contains preparation and image formation in a silver iodide-albumen photosensitive layer on a glass plate. It consists of following items; introduction, cleaning of glass plate, preparation and coating of iodide-albumen solution, sensitization, light exposure, development, fixing, washing and drying. Interpretation was a little difficult, because the manuscript was composed of classical Chinese characters, “hentai-kana”, classical Japanese character, and old Dutch technical terms and units. Sensitometric exposure of plates was operated in the way of time scale, because a light wedge could not be contact with the wet surface of plates. ISO photographic speed calculated from the results of 5500 K sensitometry was equivalent to 4×10-4, although exposure index was about ten times larger in taking picture as is mentioned in the later part of the abstract. Development time was shortened by treatment with saturated gallic acid solution before light exposure. Solarization of image appeared in the higher exposure region without the treatment. In addition to them, it was desired to add silver nitrate solution into a gallic acid developer to obtain a negative image having proper density on the plate. Spectral response was observed in the region of 330 nm-500 nm with maximum sensitivity at 400 nm. Exposure index of the plate was 4×10-3 in taking picture, owing to the sensitivity to ultra violet and blue rays. It took 10-15 minutes at F numbers of 8-11 to take portrait or still life in the open air. Some consideration was made for the reason why “Potokarahii” was not published in those days.View full abstractDownload PDF (4219K) -
Kieko HARADA, Kazuyuki SUGITA, Shin SUZUKI1989 Volume 52 Issue 3 Pages 241-248
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSQuantum yields (φa) of photofading were measured on azo dyes, 2-(substituted phenyl-azo)-1-naphtho1-4-sulfonic acid (SBD-NW). The reaction constant (ρ) of φα-Hammett's substituent constant (σ) plots was negative, which suggests photofading of SBD-NW proceeding through photooxidation by oxygen. The colored image formed with an azo dye derived from a photosensitive diazonium compound faded faster than that from an imsemsltive one. The coloring and photofading of the azo dye were controlled by addition of metallic salts. The absorption maxima of colored paper added with MgCl2, AICl3, ZnCl2 and NiCl2 showed bathocromic effect. It was detected by IR spectrum that the metal ion was combined with N=N bond and hydroxyl group of SBD-NW. The degree of bathocromic effect and retardation of photofading of azo dyes added metallic salts decreased in the following order; NiCl2>ZnCl2>AlCl3>MgCl2. This order is the same as electronegativity of the metal.View full abstractDownload PDF (938K) -
Yoshitaro KUMAGAI1989 Volume 52 Issue 3 Pages 249-254
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSMead Imaging has begun the commercialization of a unique new photoimaging system called Cycolor® which has broad applications in color copying and reproduction. This system, which is based on the photo-hardening of acrylate monomer contained in microcapsules, has the following characteristics of panchromatic sensitivity, dry and rapid processing, high image resolution, tone reproducibility, excellent color quality and low cost.
The paper describes how Cycolor provides color images via a single exposure, and discusses the photochemistry of latent image formation in relation to the photographic characteristics such as speed, total range, short time-scale reciprocity law failure, etc.
* “Cycolor” is the registered trademark of The Mead Corporation.View full abstractDownload PDF (675K) -
Masane SUZUKI, Motonori KANAYA, Takayuki SAITO, Yoshitaka MINAMI1989 Volume 52 Issue 3 Pages 255-261
Published: June 28, 1989
Released on J-STAGE: August 11, 2011
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1989 Volume 52 Issue 3 Pages 271
Published: 1989
Released on J-STAGE: August 11, 2011
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