Journal of Photopolymer Science and Technology

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Volume 33 (2020) Issue 1 Pages 3-5

The Photopolymer Science and Technology Award

Masao Tomikawa

The Photopolymer Science and Technology Award No. 201100, the Outstanding Achievement Award 2020 was presented to Dr. Masao Tomikawa for his outstanding achievements in photo definable polyimides science and technology including the photo reaction mechanism of the Ionic-bonded-photosensitive polyimide, and the pioneering development of positive photo definable polyimide by partial esterification of poly(amic acid) for semiconductor stress buffer and for the organic light emitting diode (OLED) displays. In addition, he contributed the Cu compatibility study for the improvement to long time reliability of the polyimide and Cu interconnection.

Volume 33 (2020) Issue 1 Pages 7-9

The Photopolymer Science and Technology Award

Yukinori Yamauchi, Naoki Doi, Shin-ichi Kondo, Yasushi Sasai, Masayuki Kuzuya

The Photopolymer Science and Technology Award No. 202100, the Best Paper Award 2020, was presented to Yukinori Yamauchi^a, Naoki Doi^b, Shin-ichi Kondo^b, Yasushi Sasai^b, and Masayuki Kuzuya^c (^aMatsuyama University, ^bGifu Pharmaceutical University, ^cChubu Gakuin University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 32, (2019) 505-510, entitled “Development of A Novel Polymeric Prodrug Synthesized Using Plasma-induced Radicals of Polycrystalline Carbohydrates”.

Volume 33 (2020) Issue 1 Pages 11-13

The Photopolymer Science and Technology Award

Kevin Wylie, Yuta Nabae, Teruaki Hayakawa

The Photopolymer Science and Technology Award No. 202200, the Best Paper Award 2020, was presented to Kevin Wylie, Yuta Nabae, and Teruaki Hayakawa (Department of Materials Science and Technology, Tokyo Institute of Technology) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 32, (2019) 395-400, entitled “Altering the Self-Assembly of Poly(styrene-block-methyl methacrylate) by Introduction of Strongly Dissimilar Molecules at the Block Interface”.

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2022 Volume 35 Issue 4

Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma Khant Nyar Paing, Takeshi Aizawa, Hiroto Nishioka, Masashi Yamamoto, Tasuku Sakurai, Bat-Orgil Erdenezaya, Yusuke Kayamori, Yusuke Nakano, Yasunori Tanaka, Tatsuo Ishijima
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials Masahiro Furutani, Ritsuto Senkyo
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes Yasushi Sasai, Daiki Ousaka, Yasuhiro Fujii, Aoi Isono, Yukinori Yamauchi, Shin-ichi Kondo, Tatsuyuki Nakatiani
Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication Takashi Doi, Isao Nishimura, Masahiro Kaneko, Tsutomu Shimokawa

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