Journal of Photopolymer Science and Technology

Featured article

Volume 36 (2023) Issue 1 Pages 7-10

The Photopolymer Science and Technology Award

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.

Volume 36 (2023) Issue 1 Pages 5-6

The Photopolymer Science and Technology Award

Seihou Jinnai, Yutaka Ie

The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.

Volume 36 (2023) Issue 1 Pages 3-4

The Photopolymer Science and Technology Award

Tomotaka Tsuchimura

The Photopolymer Science and Technology Award No. 212100, the Best Paper Award 2021, was presented to Tomotaka Tsuchimura (FUJIFILM Corporation) for his outstanding contribution published in Journal of Photopolymer Science and Technology, 33, (2020) 15-26, entitled “Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials”.

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2024 Volume 37 Issue 5

Novel Low D_f Photosensitive Materials for Redistribution Layer Akihiko Otoguro, Toshiharu Kuboyama, Osamu Onishi
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO₂-SiO₂ Gas-Permeable Porous Mold Rio Yamagishi, Sayaka Miura, Mano Ando, Yuna Hachikubo, Naoto Sugino, Yoshiyuki Yokoyama, Kaori Yasuda, Satoshi Takei
Feature-size Control by Pattern Transfer Etching in Nanoimprint Lithography for Half-pitch 24 nm Damascene Interconnect Kenta Suzuki, Tetsuya Ueda, Hiroshi Hiroshima, Yoshihiro Hayashi, Masaki Ishida, Tomomi Funayoshi, Hiromi Hiura, Noriyasu Hasegawa, Kiyohito Yamamoto
Development of A Low k Thermosetting Resin Based on 5,5’6,6’-Tetrahydroxy-3,3,3’,3’-Tetramethylspirobisindane with Decafluorobiphenyl Having Ethynyl Terminals Yuji Shibasaki, Atsushi Kawabata, Yu Konno

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